Lam Research Corporation

Lam Researh Corporation

Hinds Instruments, Inc.

Andrew H Breninger

Anand Chandrashekar

Leonard Wai Fung Kho

Bo Gong

Huatan Qiu

Curtis Warren Bailey

Gang Liu

Geoffrey Hohn

Guangbi Yuan

Damodar Rajaram Shanbhag

Fengyuan Lai

Chen-Hua Hsu

Krishna Birru

Rohit Khare

Tony Kaushal

William Schlosser

Thadeous Bamford

Ramesh Chandrasekharan

Paul Konkola

Gary B Lind

Bin Luo

Christopher O Griffiths

Brian Lewis Ratliff

David James Shusteric

Tony Shaleen Kaushal

Plasma viewports for high-temperature environments in semiconductor processing equipment are disclosed; such viewports may use a triple-window design, with each window providing particular functionality.

Plasma viewport

A processing tool, comprising a processing chamber for processing a work piece, the processing chamber including at least one component part that is coated with multi-layer protective coating including (a) an aluminum layer formed on the at least one component part and (b) a ceramic coating formed on the aluminum layer. In various embodiments, the multi-layer protective coating can be applied to at least one component part prior to assembly of the processing chamber or at least partially in situ the processing chamber.

Multilayer coatings of component parts for a work piece processing chamber

Forming a protective coating ex situ in an atomic layer deposition process to coat one or more chamber components subsequently installed in a reaction chamber provides a number of benefits over more conventional coating methods such as in situ deposition of an undercoat. In certain cases the protective coating may have a particular composition such as aluminum oxide, aluminum fluoride, aluminum nitride, yttrium oxide, and/or yttrium fluoride. The protective coating may help reduce contamination on wafers processed using the coated chamber component. Further, the protective coating may act to stabilize the processing conditions within the reaction chamber, thereby achieving very stable/uniform processing results over the course of processing many batches of wafers, and minimizing radical loss. Also described are a number of techniques that may be used to restore the protective coating after the coated chamber component is used to process semiconductor wafers.

Ex situ coating of chamber components for semiconductor processing

A lift pin holder assembly includes a lift pin holder including a central bore defining a first groove arranged on a radially inner surface of the central bore. The lift pin holder is made of a non-metallic material. A lift pin includes a second groove arranged on a radially outer surface thereof. A spring is at least partially arranged in the first groove of the lift pin holder and the second groove of the lift pin to retain the lift pin in the lift pin holder.

Lift pin holder with spring retention for substrate processing systems

A holder for optical elements, or samples, in an optical setup. The holder is readily adjustments to accommodate samples of various sizes, such as cylindrical shaped samples of various diameters. The holder provides stable support for the sample, irrespective of the size of the sample and maximizes the area of the sample through which a light beam may pass as part of the analysis of the optical properties of the sample.

Adjustable sample holder for optical equipment

Growing community of inventors

Hillsboro, OR, United States of America

Andrew H Breninger