National Technology & Engineering Solutions of Sandia, LLC

Andrew David Baczewski

Daniel Robert Ward

George T Wang

John King Gamble, Iv

Evan Michael Anderson

Shashank Misra

Noah Tobias Jacobson

Andrew Mounce

Wayne Witzel

Aaron Michael Katzenmeyer

Martin Rudolph

Ryan Michael Jock

Malcom S Carroll

Patrick Harvey-Collard

In a method of atomic precision advanced manufacturing (APAM), an atomic or molecular resist layer on a substrate surface is selectively depassivated by locally exciting the substrate surface with an optical beam effective to eject adsorbed atoms or molecules from the substrate surface. The substrate surface is further processed by exposing it to a precursor gas, decomposing the precursor gas to release a dopant, and incorporating the dopant into the substrate surface.

Photolithography of atomic layer resist

Methods and apparatus of quantum information processing using quantum dots are provided. Electrons from a 2DEG are confined to the quantum dots and subjected to a magnetic field having a component directed parallel to the interface. Due to interfacial asymmetries, there is created an effective magnetic field that perturbs the energies of the spin states via an interfacial spin-orbit (SO) interaction. This SO interaction is utilized to controllably produce rotations of the electronic spin state, such as X-rotations of the electronic spin state in a double quantum dot (DQD) singlet-triplet (ST) qubit. The desired state rotations are controlled solely by the use of electrical pulses.

Spin-orbit qubit using quantum dots

Growing community of inventors

Albuquerque, NM, United States of America

Andrew David Baczewski