International Business Machines Corporation

Andrew Bessy

James L Speidell

James Patrick Doyle

C Richard Guarnieri

Kenneth D Murray

Vaughn P Gross

Rick J Heh

A static resistant reticle for use in photolithography having optimal transmission and reduced electrostatic discharge. The reticle comprises a substrate, a patterning layer, and two layers of material having a first refractive index and a second refractive index wherein the first refractive index is greater than the second refractive index and at least one of the layers is conductive. The refractive indices and thickness of the layers are matched to create an anti-reflective coating. The anti-reflective coating optimizes transmission of light through the reticle substrate to about 98.0% to about 99.5% at a wavelength of about 360 nm to about 370 nm. The conductivity of at least one of the layers reduces electrostatic discharge further improving delineation of the pattern projected onto a silicon wafer of a semiconductor device. Preferably, the anti-reflective coating comprises two or more layers of cermet material. The layer of material having a first refractive index is most preferably ruthenium oxide or ruthenium oxide with alumina. The second layer of material having a second refractive index is most preferably silica. A method of fabricating a static resistant reticle, and a method of patterning a silicon wafer using the reticle of the present invention is also described.

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South Burlington, VT, United States of America

Andrew Bessy