Promerus, Lcc

Sumitomo Bakelite Company Limited

Merck Patent Gmbh

Other

The B. F. Goodrich Company

California Institute of Technology

Eastman Chemical Company

University of Akron

Cymetech, L.l.c.

Peomerus LLC

Materia, Inc.

Andrew Bell

Larry Funderburk Rhodes

Edmund Elce

Hendra Ng

Robert A Shick

Keitaro Seto

W C Peter Tsang

Ramakrishna Ravikiran

Dino Amoroso

Wei Zhang

Leah Langsdorf

Brian F Knapp

Xiaoming Wu

Christopher Apanius

Brian L Goodall

Pawel Miskiewicz

John-Henry Lipian

Saikumar Jayaraman

Pramod Kandanarachchi

Toby Cull

John C Fondran

Dane Jablonski

Makoto Fujiwara

Oleksandr Burtovyy

Kazuyoshi Fujita

Tetsuya Mori

Hiroaki Makabe

Dennis A Barnes

Koji Choki

Cheryl Burns

Steven J Smith

Keizo Takahama

Kei Watanabe

Hirotaka Nonaka

Mutsuhiro Matsuyama

Sridevi Kaiti

Yumiko Otake

Rajesh Raja Puthenkovilakom

Etsu Takeuchi

Piotr Wierzchowiec

Richard A Mimna

Chris Apanius

Phil Neal

Yasunori Takahashi

Miguel Carrasco-Orozco

Tomas Backlund

Chun S Chang

David Christoph Müller

Brian Bedwell

David Christoph Mueller

Royce Groff

Crystal D Cyrus

Brian K Bennett

Hongshi Zhen

Phillip S Neal

Linda Zhang

Seishi Ohashi

Tamami Takigawa

Daoji Gan

Seok Ho Kang

Brian Kocher

Yogesh Patel

Masanobu Sakamoto

Elaine Koronich

Robert H Grubbs

Christine Nicole Elia

Dietrich M Fabricius

Ayusman Sen

Philip Edward May

Li Wei Tan

Haruo Ikeda

Steven P Nolan

Jason Lee Moore

John P Morgan

Peter Wyatt Newsome

Laura M Babcock

Osamu Onishi

Paul Craig Brookes

Xiao-Mei Zhao

Irina Afonina

Jennifer D Polley

Dennis G Morrell

April D Hennis

Kazunobu Senoo

Yumiko Yamanoi

John N Kostas

William DiMenna

Jason L Moore

Bryan D Vogt

Yoshiaki Fukunishi

Chad Brick

Jianyong Jin

John Henry Lipian

Ramakrisha Ravikiran

Stephen Westcott

Brian K Bennet

Robert G Potter

Chung Chang

Changhuai Ye

Oscar Navarro Fernandez

Embodiments in accordance with the present invention relate generally to polycarbonate polymers having repeat units derived from adamantane epoxide monomers and methods of using such polymers and compositions containing them. The compositions thus formed are useful in a variety of optoelectronic device fabrications.

High glass transition temperature polycarbonates derived from adamantane epoxides

A pervaporation membrane formed from a series of vinyl addition block polymers derived from functionalized norbornene monomers are disclosed and claimed. Also disclosed are the fabrication of membranes which exhibit unique separation properties, and their use in the separation of organic volatiles from biomass and/or organic waste, including butanol, phenol, and the like.

Pervaporation membranes derived from polycyclo-olefinic block copolymers

A variety of polycycloalkyl polynorbornene monomers and polymers derived therefrom are disclosed and claimed. The polymers and copolymers as disclosed herein are useful for forming pervaporation membranes, among other uses.

Cycloalkylnorbornene monomers, polymers derived therefrom and their use in pervaporation

A nanoporous film formed from a series of vinyl addition block polymers derived from functionalized norbornene monomers are disclosed and claimed. The nanoporous films as disclosed herein are useful as pervaporation membranes and antireflective coatings among various other uses. Also disclosed herein are the fabrication of nanoporous films into pervaporation membranes which exhibit unique separation properties, and their use in the separation of organic volatiles from biomass and/or organic waste, including butanol, phenol, and the like. The fabrication of nanoporous films into antireflective coatings are also disclosed.

Nanoporous films derived from polycyclo-olefinic block polymers

Embodiments in accordance with the present invention provide sacrifical polymer compositions and methods for fabricating electronic devices using such sacrifical polymer compositions where such methods include (1) providing a tacky sacrifical polymer composition that holds components in a desired alignment to one another, (2) providing solder fluxing for effecting electrical coupling; and (3) thermal decomposition or depolymerization of the sacrificial polymer composition to provide essentially residue free surfaces.

Thermally decomposable polymer compositions incorporating thermally activated base generators

Embodiments in accordance with the present invention encompass polymer compositions that are useful in the assembly of microelectronic components onto a variety of substrate materials. Such polymer compositions providing for both holding the microelectronic components at desired positions on a substrate, providing fluxing for the solder bonding of such components to the substrate and remaining in place as an underfill for such components.

Polymer composition for microelectronic assembly

A thermally decomposable polymer composition comprising a polyester of a dicarboxylic acid and a tertiary cyclohexanediols of Formulae V and VI are disclosed, which are useful in the forming of microelectronic assemblies: a representative example of a dicarboxylic acid is an oxalic acid and representative example of thermally decomposable polyester is the polyester of the formula: wherein m is at least about 100.

Thermally decomposable polymer compositions for forming microelectronic assemblies

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.

Gate insulator layer for organic electronic devices

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.

Interlayer for electronic devices

A series of vinyl addition block polymers derived from functionalized norbornene monomers are disclosed and claimed. Specifically, a series of diblock and triblock polymers derived from norbornene monomers are disclosed. Also disclosed are the method of preparation of such block polymers, and their use in the fabrication of membranes which exhibit unique separation properties.

Polycyclo-olefinic block copolymers

The present invention relates to polynorbornene (PNB) composition embodiments that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs having norbornene-type repeating units that are polyether functionalized and an additive package containing a phenolic antioxidant and a diaryl amine synergist, and the microelectronic and/or optoelectronic devices made therefrom are resistant to thermo-oxidative chain degradation of said polyether functionalization.

Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof

Embodiments in accordance with the present invention relate generally to polycarbonate polymers having repeat units derived from polycyclic-epoxide monomers and methods of using such polymers and compositions containing them, and more specifically to polymers and compositions of polycarbonates that encompass repeat units derived from norbornane and tetracyclododecane, and methods of using such compositions.

High glass transition temperature photoimageable polycarbonate polymers with pendent polycyclic functional groups

A process for the preparation of a variety of high purity norbornene alkanol monomers and their derivatives is disclosed and claimed. Specifically, a process for the preparation of industrial scale high purity norbornene methanol and its silyl ether derivative is disclosed and claimed. The high purity monomers prepared in accordance with the process of this invention are useful in a variety of applications including but not limited to the preparation of high quality and high purity polynorbornenes having utility in a variety of electronic applications, among various other applications.

Process for the preparation of high purity norbornene alkanols and derivatives thereof

A thermally decomposable polymer composition comprising a polyester containing repeating units of an ester of diglycolic acid and difunctional tertiary alcohol are disclosed, which are useful in the forming of microelectronic assemblies. A representative example of a composition comprises a thermally decomposable polymer of the formula: wherein n is at least about 20, which provides both tackiness and solder fluxing, among other benefits.

Growing community of inventors

Lakewood, OH, United States of America

Andrew Bell