Kla Tencor Corporation

Nehp Inc.

Andrew Beers

Randall S Mundt

Mason L Freed

Paul Douglas MacDonald

Costas J Spanos

Dean Hunt

Adam L Tarr

Joseph E Mastro

A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor.

Methods of and apparatuses for measuring electrical parameters of a plasma process

Methods of and apparatuses for maintenance, diagnosis, and optimization of processes

A modular exhaust gas header designed for use with a process tool having a plurality of exhaust gas points of connection. Embodiments of the modular exhaust gas header include a plurality of branch ducts, at least one for each point of connection in the process tool. Branch ducts, and primary ducts with which they are fluidly connected, may be made from materials designed to withstand exhaust gases that have a high temperature, are corrosive, and/or include volatile solvents. If desired, flow control devices and pressure monitoring instrumentation that selectively measures pressure may be used in each branch duct. The header local to the processing system may be incorporated in a method of designing a layout for a manufacturing process tool and associated exhaust gas handling systems.

Modular exhaust gas header and method of incorporating same in design layout for a manufacturing process machine

A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and at least one transducer coupled to the at least one sensing element. The transducer is configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.

One or more problems related to processing workpieces using processes that involve optical radiation are presented along with solutions to one or more of the problems. One embodiment of the invention comprises a sensor apparatus for collecting optical radiation data representing one or more process conditions used for processing a workpiece. In a further embodiment, the sensor apparatus is also configured for measuring data other than optical radiation.

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Liberty Hill, TX, United States of America

Andrew Beers