International Business Machines Corporation

Andrei Fustochenko

Hariklia Deligianni

Roy Rongqing Yu

Damon B Farmer

Emily R Kinser

Yu Luo

Ying He

Cristina Camagong

A method for forming a nanostructure includes coating an exposed surface of a base layer with a patterning layer. The method further includes forming a pattern in the patterning layer including nano-patterned non-random openings, such that a bottom portion of the non-random openings provides direct access to the exposed surface of the base layer. The method also includes depositing a material in the non-random openings in the patterning layer, such that the material contacts the exposed surface to produce repeating individually articulated nano-scale features. The method includes removing remaining portions of the patterning layer. The method further includes forming an encapsulation layer on exposed surfaces of the repeating individually articulated nanoscale features and the exposed surface of the base layer.

Nanostructure featuring nano-topography with optimized electrical and biochemical properties

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New City, NY, United States of America

Andrei Fustochenko