Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Asml Netherlands B.v.

Andreas Wurmbrand

Bernhard Gellrich

Franz Sorg

Jens Kugler

Thomas Schletterer

Christiaan Alexander Hoogendam

Bob Streefkerk

Thomas Ittner

Erik Roelof Loopstra

Dirk Schaffer

Siegfried Wahl

Ulrich Loering

Juergen Fischer

Thomas Petasch

Bernard Gellrich

Johannes Jacobus Matheus Baselmans

Wilhelm Ulrich

Aurelian Dodoc

Hubert Holderer

Yim-Bun Patrick Kwan

Dirk Heinrich Ehm

Hans-Juergen Rostalski

Stefan Xalter

Susanne Beder

Armin Schoeppach

Paul Graeupner

Bauke Jansen

Vladimir Kamenov

Jens Prochnau

Stefan-Wolfgang Schmidt

Peter Deufel

Moritz Becker

Karl Heinz Schuster

Yim-Bun-Patrick Kwan

Joerg Mallmann

Viktor Kulitzki

Albrecht Ranck

Christian Zengerling

Stephane Bruynooghe

Markus Kern

Viktor Kulitsky

The disclosure relates to a mirror module, in particular for a microlithographic projection exposure apparatus, including a mirror, which has a mirror body and an optically effective surface. The mirror body has a first material, and a supporting structure for connecting the mirror body to an objective structure. The supporting structure has a second material. The first material and the second material differ in terms of their coefficients of thermal expansion by less than 0.5*10Kin a temperature range around an operating temperature which is reached by the mirror module during operation in the region of the connection of the mirror body to the supporting structure.

Mirror module, in particular for a microlithographic projection exposure appararatus

An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

Optical arrangement in a projection exposure apparatus for EUV lithography

Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

Lithographic apparatus and device manufacturing method

A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.

Replacement apparatus for an optical element

A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.

Holding device for an optical element in an objective

The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (). The optical element is connected to the mount () at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount () and optical element. The mount () is provided with at least three support feet () distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount () is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points ().

Device for the low-deformation replaceable mounting of an optical element

A projection lens of a projection exposure apparatus, for imaging a mask which can be positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane, includes a housing, in which at least one optical element is arranged, at least one partial housing which is arranged within said housing and which at least regionally surrounds light passing from the object plane as far as the image plane during the operation of the projection lens, and a reflective structure, which reduces a light proportion which reaches the image plane after reflection at the at least one partial housing, by comparison with an analogous arrangement without said reflective structure.

Projection objective of a microlithographic projection exposure apparatus

An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

Immersion lithography objective

Growing community of inventors

Aalen-Reichenbach, Germany

Andreas Wurmbrand