Schott Ag

Schott Ml Gmbh

Other

Andreas Voitsch

Andreas Menzel

Matthias Schmidt

Thomas Kloss

Gerhard Lautenschläger

Frank Coriand

Jochen Alkemper

Hartmut Bauch

Ute Natura

Axel Engel

Thomas Schmiady

Oliver Sohr

Rolf Martin

Andreas Krieg

Christian Pitzel

Roland Scholz

Thomas Schindelbeck

Frank Rudiger

Hraban Hack

Gordon Von Der Gönna

A flat glass is provided that exhibits high transmittance to electromagnetic radiation in a range of wavelengths from 200 nm to 1500 nm. The transmittance for the flat glass having a thickness of 1 mm is 20% or more at a wavelength of 254 nm, 82% or more at a wavelength of 300 nm, 90% or more at a wavelength of 350 nm, 92% or more at a wavelength of 546 nm, 92.5% or more at a wavelength of 1400 nm, 91.5% or more in a wavelength range from 380 nm to 780 nm, and 92.5% or more in a wavelength range from 780 nm to 1500 nm.

Flat glass, method for producing same, and use thereof

A light guide plate for guiding of visible light for the backlighting of a liquid crystal display is provided. The light guide plate has two parallel lateral faces and at least one edge face, which serves preferably as a light input face. The light guide plate is a glass that contains BOand SiOas components, wherein the total content of BOand SiOis at least 70 weight percent and the BOcontent is greater than 10%. The total content of metal oxide of divalent metals in the composition of the glass is less than 3 weight percent. AlOis contained between 1 weight percent and 5 weight percent in the composition.

Light guide plate and optical display with backlighting

A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains &#x2267;1150 ppm OH, a strain double refraction of &#x2266;5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of &#x394;T &#x2266;0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength &#x3bb;=248 nm, laser shot frequency &#x2267;300 Hz, laser shot value &#x2267;10and lumination &#x2266;10 mJ/cm, and wavelength &#x3bb;=193 nm, laser shot frequency &#x2267;300 Hz, laser shot value &#x2267;10and lumination &#x3c;5 mJ/cm. Apparatus for producing the preform comprises a horizontally positioned muffle with two different sized openings facing each other. The larger of the openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.

Apparatus for producing synthetic quartz glass

A device for producing optically homogeneous, streak-free quartz glass bodies having a large diameter including a furnace or melting device having an inner chamber with a pair of openings opposite one another. One or more movable burners are displaceable into one of the openings and the respective glass body to be produced is located in the other opening. Both the burner and glass body are movably positioned. In the course of the production of the quartz glass body, a relative movement is effected in the axial and radial directions between the burner and the quartz glass body such that the distance from the burner outlet opening pertaining to the quartz glass body decreases as the distance from the burner to the X-X axis of the quartz glass body increases.

Device for generating an optically homogeneous, streak-free quartz glass body having a large diameter

The invention relates to a synthetic quartz glass preform which is produced according to the flame hydrolysis technique with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. Said preform has a core area which contains &gE;1150 ppm OH, a strain double refraction of &lE;5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of &Dgr; T &lE;0.1 %/cm thickness. The quartz glass has been exposed to the following radiation: wavelength &lgr; &equals;248 nm, laser shot frequency &gE;300 Hz, laser shot value &gE;10 and rumination &lE;10 mJ/cm , and wavelength &lgr; &equals;193 nm, laser shot frequency &gE;300 Hz, laser shot value &gE;10 and rumination &lE;5 mJ/cm . A device for producing said preform comprises a horizontally positioned muffle with two different-sized openings facing each other. The larger of said openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.

Synthetic quartz glass preform

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Jena, Germany

Andreas Voitsch