Ernst Leitz Wetzlar Gmbh

Andreas Thaer

Knut Heitmann

Willi Hagner

Eckhard Schneider

Martin Hoppe

Horst Frimmel

Horst Riegel

Francis Bigar

A process for modifying structural profiles produced by polymerization or depolymerization in resist layers. As a function of the acoustic impedance of the substrate carrying the resist layer, the structures are irradiated with an ultrasonic beam. An ultrasonic beam for which the substrate represents a high impedance is used in order to enhance the contrast of the structures. An ultrasonic beam for which the substrate represents a low impedance is used to weaken the contrast. An acoustic microscope is especially suitable for carrying out the process.

Process for modifying structural profiles in resist layers

A process for the production of structures by the polymerization, or fragmentation of resist layers comprising the steps of effecting an incomplete exposure of the resist layer corresponding to the pattern of the structures, and of fully developing the structure in the resist layer by ultrasonic irradiation. An acoustic microscope is preferably used for the ultrasonic irradiation, whereby the formation of the structure in the resist layer may also be observed.

Process for producing structures in resist layers using ultrasonic

Disclosed is an adjustable instrument base suitable for holding optical instruments, comprising a base plate movable along first and second horizontal coordinate directions; a housing member surrounding the base plate and being movable with respect to the base plate in the first coordinate direction; first and second mechanisms mounted on the housing member for effecting displacement of the base plate in the first and second coordinate directions, respectively; a generally U-shaped stirrup member mounted on the base plate for rotation; a support plate mounted on the stirrup member for rotation about a horizontal axis; a first and preferably second instrument carriers displaceably mounted on the support plate; and a mechanism mounted on said base plate for effecting vertical displacement of the first instrument carrier.

Instrument base for optical devices

An optical system for the reflecting microscopic examination of objects. An illuminating beam path and an observation beam path are provided along with an optical lens such that the beam paths pass through the optical lens and make an angle with each other. The lens is made up of two portions interfacing in a plane which bisects the angle of the beam paths and is perpendicular to a plane containing the beam paths. The interface between the lens portions is at least partially opaque and serves to absorb or reflect light reflected from the lens/object interface and thereby prevents such light from obscuring light reflected from surfaces interior to the object. The optical system is particularly advantageous for the examination of biological tissue such as the endothelium layer of the cornea of the eye.

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Leihgestern, Germany

Andreas Thaer