Infineon Technologies Austria Ag

Infineon Technologies Ag

Andreas Riegler

Hans Weber

Christian Fachmann

Franz Hirler

Matteo-Alessandro Kutschak

Manfred Pippan

Wolfgang Jantscher

Gabor Mezoesi

Mathias Plappert

Carsten Von Koblinski

Maik Stegemann

Frank Wolter

Angelika Koprowski

Björn Fischer

Barbara Angela Glanzer

Ralf Otremba

Oliver Blank

Petteri Palm

Werner Schustereder

Ravi Keshav Joshi

Juergen Steinbrenner

Stefan Krivec

Bjoern Fischer

David Kammerlander

Markus Ottowitz

Petra Fischer

Karin Schrettlinger

Alexander Binter

Waqas Mumtaz Syed

Ulrich Froehler

Kurt Pekoll

A transistor device is disclosed. The transistor device includes: a semiconductor body (); a drift region () in the semiconductor body (); a plurality of transistor cells (); and a gate node (G) and a source node (S), wherein each of the plurality of transistor cells () includes: a first trench electrode () insulated from the semiconductor body () by a first dielectric layer (); a second trench electrode () insulated from the semiconductor body () by a second dielectric layer (); a source region () and a body region () in a first mesa region () between the first trench electrode () and the second trench electrode (); and a compensation region (), wherein the compensation region () adjoins the body region (), the first dielectric (), the second dielectric (), and forms a pn-junction with the drift region (), and wherein from the first trench electrode () and the second trench electrode () at least the first trench electrode () is connected to the gate node (G).

Superjunction transistor device

A high voltage semiconductor package includes a semiconductor device. The semiconductor device includes a high voltage semiconductor transistor chip having a front side and a backside. A low voltage load electrode and a control electrode are disposed on the front side of the semiconductor transistor chip. A high voltage load electrode is disposed on the backside of the semiconductor transistor chip. The semiconductor package further includes a dielectric inorganic substrate. The dielectric inorganic substrate includes a pattern of first metal structures running through the dielectric inorganic substrate and connected to the low voltage load electrode, and at least one second metal structure running through the dielectric inorganic substrate and connected to the control electrode. The front side of the semiconductor transistor chip is attached to the dielectric inorganic substrate by a wafer bond connection, and the dielectric inorganic substrate has a thickness of at least 50 μm.

Semiconductor package including a chip-substrate composite semiconductor device

A method of manufacturing a semiconductor device includes forming a plurality of patterns of metal structures in a dielectric inorganic substrate wafer. The metal structures are accommodated in recesses of the dielectric inorganic substrate wafer and at least partly connect through the dielectric inorganic substrate. The method further includes providing a semiconductor wafer comprising a front side and a backside, wherein a plurality of electrodes is disposed on the front side of the semiconductor wafer. The front side of the semiconductor wafer is bonded to the dielectric inorganic substrate wafer to form a composite wafer, wherein the plurality of patterns of metal structures is connected to the plurality of electrodes. The composite wafer is separated into composite chips.

Chip-substrate composite semiconductor device

A semiconductor device is proposed. An example of the semiconductor device includes a semiconductor body having a first main surface. A trench structure extends into the semiconductor body from the first main surface. The trench structure includes a trench electrode structure and a trench dielectric structure. The trench dielectric structure includes a gate dielectric in an upper part of the trench dielectric structure and a gap in a lower part of the trench dielectric structure. The semiconductor device further includes a body region adjoining the gate dielectric at a sidewall of the trench structure in the upper part of the trench dielectric structure. The gate dielectric extends deeper into the semiconductor body along the sidewall than the body region.

Semiconductor device including a trench structure having a trench dielectric structure with a gap

An electronic circuit is disclosed. The electronic circuit includes: a half-bridge with a first transistor device () and a second transistor device (); a first biasing circuit () connected in parallel with a load path of the first transistor device () and comprising a first electronic switch (); a second biasing circuit () connected in parallel with a load path of the second transistor device () and comprising a second electronic switch (); and a drive circuit arrangement (DRVC). The drive circuit arrangement (DRVC) is configured to receive a first half-bridge input signal (Sin) and a second half-bridge input signal (Sina), drive the first transistor device () and the second electronic switch () based on the first half-bridge input signal (Sin), and drive the second transistor device () and the first electronic switch () based on the second half-bridge input signal (Sina).

Electronic circuit with a transistor device and a biasing circuit

A method includes providing a processed first wafer having front and back sides and including power semiconductor dies implemented within the wafer by processing its front side, each die having a first load terminal at the front side and a second load terminal at the back side; providing an unprocessed second wafer made of an electrically insulating material and having first and second opposing sides; forming a plurality of recesses within the second wafer; filling the plurality of recesses with a conductive material; forming a stack by attaching, prior or subsequent to filling the recesses, the second wafer to the front side of the first wafer, the conductive material electrically contacting the first load terminals of the power semiconductor dies; and ensuring that the conductive material provides an electrical connection between the first side and the second side of the second wafer.

Multi-die-package and method

A semiconductor device package includes a printed circuit board including a first central area, a second lateral area, and a third lateral area, a semiconductor die including a first main face and a second main face opposite the first main face, a first contact pad on the first main face and a second contact pad on the second main face, the semiconductor die disposed in the first central area of the printed circuit board, a first metallic side wall of the semiconductor device package disposed in the second lateral area of the printed circuit board, a second metallic side wall of the semiconductor device package disposed in the third lateral area of the printed circuit board, wherein at least one of the first metallic side wall and the second metallic side wall is electrically connected with one of the first contact pad or the second contact pad.

Semiconductor device package comprising side walls connected with contact pads of a semiconductor die

Electronic circuits are disclosed. One electronic circuit includes: a transistor device having a load path and a drive input; a first drive circuit configured to receive a supply voltage and generate a drive signal for the transistor device based on the supply voltage; and a biasing circuit connected in parallel with the load path of the transistor device. The biasing circuit includes a bias voltage circuit configured to receive the supply voltage and generate a bias voltage higher than the supply voltage based on the supply voltage.

Electronic circuit having a transistor device and a biasing circuit

A MOSFET includes a semiconductor body having a first side, a drift region, a body region forming a first pn-junction with the drift region, a source region forming a second pn-junction with the body region, in a vertical cross-section, a dielectric structure on the first side and having an upper side; a first gate electrode, a second gate electrode, a contact trench between the first and second gate electrodes, extending through the dielectric structure to the source region, in a horizontal direction a width of the contact trench has, in a first plane, a first value, and, in a second plane, a second value which is at most about 2.5 times the first value, and a first contact structure arranged on the dielectric structure having a through contact portion arranged in the contact trench, and in Ohmic contact with the source region.

Methods for manufacturing a MOSFET

A connection body which comprises a base structure at least predominantly made of a semiconductor oxide material or glass material, and an electrically conductive wiring structure on and/or in the base structure, wherein the electrically conductive wiring structure comprises at least one vertical wiring section with a first lateral dimension on and/or in the base structure and at least one lateral wiring section connected with the at least one vertical wiring section, wherein the at least one lateral wiring section has a second lateral dimension on and/or in the base structure, which is different to the first lateral dimension.

Semiconductor oxide or glass based connection body with wiring structure

A transistor device is enclosed. The transistor device includes: a semiconductor body; a plurality of drift regions of a first doping type; a plurality of compensation regions of a second doping type adjoining the drift regions; and a plurality of transistor cells each including a body region adjoining a respective one of the plurality of drift regions, a source region adjoining the body region, and a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric. The source regions of the plurality of transistor cells are connected to a source node, the body regions of the plurality of transistor cells are separated from the plurality of compensation regions in the semiconductor body, and the plurality of compensation regions are ohmically connected to the source node.

Superjunction transistor device with soft switching behavior

A method for operating a superjunction transistor device and a transistor arrangement are disclosed. The method includes operating the superjunction transistor device in a diode state. Operating the superjunction transistor device in the diode state includes applying a bias voltage different from zero between a drift region of at least one transistor cell of the superjunction transistor device and a compensation region of a doping type complementary to a doping type of the drift region. The compensation region adjoins the drift region, and a polarity of the bias voltage is such that a pn-junction between the drift region and the compensation region is reverse biased.

Method for operating a superjunction transistor device

A package and a corresponding method are described. The method includes: providing a processed first wafer having front and back sides and including power semiconductor dies implemented within the wafer by processing its front side, each die having a first load terminal at the front side and a second load terminal at the back side; providing an unprocessed second wafer made of an electrically insulating material and having first and second opposing sides; forming a plurality of recesses within the second wafer; filling the plurality of recesses with a conductive material; forming a stack by attaching, prior or subsequent to filling the recesses, the second wafer to the front side of the first wafer, the conductive material electrically contacting the first load terminals of the power semiconductor dies; and ensuring that the conductive material provides an electrical connection between the first side and the second side of the second wafer.

A method for manufacturing a MOSFET semiconductor device includes providing a wafer including a semiconductor body having a first side, a first semiconductor region adjacent to the first side, a second semiconductor region adjacent to the first side and forming a first pn-junction with the first semiconductor region, and a third semiconductor region adjacent to the first side and forming a second pn-junction with the second semiconductor region, a first dielectric layer arranged on the first side, a gate electrode embedded in the first dielectric layer, and a second dielectric layer arranged on the first dielectric layer. Next to the gate electrode, a trench is formed through the first dielectric layer and the second dielectric layer. At a side wall of the trench, a dielectric spacer is formed. The trench is extended into the semiconductor body to form a contact trench.

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Lichtpold, Austria

Andreas Riegler