Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Andreas Pflug

Michael Vergöhl

Tobias Zickenrott

Stefan Bruns

Bernd Szyszka

André Kaiser

Thomas Melzig

Stephan Ulrich

Roman Graf

The invention relates to a method for producing layers with very good uniformity in coating systems with horizontally rotating substrate guiding. Alternatively, certain layer thickness gradients can be set. The particle loading is also significantly reduced. The service life is much higher compared to other methods. Parasitic coatings are reduced. The coating rate is also increased.

Method for producing layers with improved uniformity in coating systems with horizontally rotating substrate guiding

According to the invention, a device is provided for coating substrates having planar or shaped surfaces by means of magnetron sputtering, by means of which device surfaces having any shape, for examples lenses, aspheres or freeform surfaces which have an adjustable layer-thickness profile, can be coated such that a layer function is maintained on the substantially complete surface. A method for coating substrates having planar or shaped surfaces by means of magnetron sputtering is also provided.

Device and method for coating substrates having planar or shaped surfaces by means of magnetron sputtering

The invention relates to a device and a method for producing layers whose layer thickness distribution can be adjusted in coating systems with horizontally rotating substrate. A very homogeneous or a specific non-homogeneous distribution can be adjusted. The particle loading is also significantly reduced. The service life is significantly higher compared to other methods. Forming of parasitic coatings is reduced.

Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources

A method and device for magnetron sputtering are provided. A magnetron coating system includes a first coating source and an auxiliary substrate arranged between the first coating source and an area into which a substrate to be coated is to be received. The system also includes a magnetron having a cathode composed of the auxiliary substrate. Additionally, the system includes a device structured and arranged to determine an area density of the auxiliary substrate.

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Braunschweig, Germany

Andreas Pflug