Carl-zeiss-smt Ag

Andreas Ochse

Timo Laufer

Udo Dinger

Johannes Zellner

Frank Eisert

Martin Lowisch

Harald Kirchner

Stefan Koehler

Jean-Noel Fehr

A projection objectivefor short wavelengths, in particular for wavelengths &#x3bb;&#x3c;157 nm is provided with a number of mirrors [MMMMMand Mthat are arranged positioned precisely in relation to an optical axisThe mirrors [MMMMMand Mhave multilayer coatings. At least two different mirror materials are provided which differ in the rise in the coefficient of thermal expansion as a function of temperature in the region of the zero crossing of the coefficients of thermal expansion, in particular in the sign of the size.

Projection objective

There is provided an optical component. The optical component includes a material having a surface that heats to a maximum temperature (T) when subjected to radiation. The material has a temperature-dependent coefficient of thermal expansion (&#x3b1;(T)) of about zero at a temperature Tthat is approximately equal to T. The optical component is suitable for use in any of an illumination system, a projection objective or a projection exposure system, as employed, for example, for EUV microlithography.

Optical component that includes a material having a thermal longitudinal expansion with a zero crossing

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Oberkochen, Germany

Andreas Ochse