Unaxis Deutschland Gmbh

Bps Alzenau Gmbh

Applied Materials, Inc.

Andreas Klöppel

Markus Hanika

Fabio Pieralisi

Evelyn Scheer

Johannes Stollenwerk

Marcus Bender

A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 &#x3bc;&#x3a9;cm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined BF/DC sputtering of an indium-tin oxide (ITO) target is employed and wherein the process gas is supplemented by an argon/hydrogen mixture as reaction gas during the sputtering, as well as ITO-films with the above-named characteristics.

Indium-tin oxide (ITO) film and process for its production

On a glass substrate, a base layer of indium cerium oxide is deposited, and on this a thin copper-containing silver layer, both produced by means of DC sputtering. On top there is another indium cerium oxide layer, which is produced by means of AC-superimposed DC sputter deposition. This layer system boasts very low surface resistivity combined with high transparency in the visible part of the spectrum, which means it has a high Haacke quality factor.

Conductive transparent layers and method for their production

A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 &#x3bc;&#x3a9;cm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined HF/DC sputtering of an indium-tin oxide (ITO) target is employed and wherein the process gas is supplemented by an argon/hydrogen mixture as reaction gas during the sputtering, as well as ITO-films with the above-named characteristics.

Indium-tin oxide (ITO) layer and method for producing the same

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Glauburg, Germany

Andreas Klöppel