Applied Materials Gmbh & Co Kg

Applied Films Gmbh & Co.

Andreas Jischke

Hans Georg Wolf

Jörg Krempel-Hesse

Dieter Haas

Uwe Schüssler

Oliver Heimel

Uwe Schüβler

Uwe SCHÜßLER

To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier () is disposed the sputter target () with a backing plate (), which maintains a gap () from the carrier (). The backing plate () is developed as a cooling plate. In it are located cooling means channels (), which, via an inlet () through the carrier (), are supplied with cooling fluid, which can flow out again via an outlet () through the carrier (). On the atmospheric side is located a magnet configuration ().

Magnetron sputter cathode

The present invention concerns a device for transporting substrates through vacuum chambers, especially coating machines with a substrate carrier on or at which the substrates can be arranged, wherein the substrate carrier has at least one guide rail which extends along at least one side of the substrate carrier, and wherein the guide rail is kept spaced apart from the substrate carrier by one or just a few spaced bearings.

Vacuum transport device with movable guide rail

Claimed is a sputtering target system comprising a plurality of backing plates to be individually cooled. Each backing plate is provided on its back side with a meandering groove that is closed off by a sealing plate. The sealing plate is welded around its circumference to the backing plate and at the same time is welded to at least one ridge located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate.

Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates

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Kahl, Germany

Andreas Jischke