Heraeus Deutschland Gmbh & Co Kg

Materion Advanced Materials Germany Gmbh

Andreas Herzog

Martin Schlott

Christoph Simons

Uwe Konietzka

Markus Schultheis

Sabine Schneider-Betz

Christoph Stahr

Anna Schott

Thomas Scholl

The present invention relates to a sputtering target, which comprises a zirconium oxide as a sputtering material, wherein the zirconium oxide

Zirconium oxide based sputtering target

A sputtering target is provided which ensures the production of unvaryingly homogenous layers of the sputtering material during the lifespan of the sputtering target. The sputtering target includes a mixture of oxides of indium, zinc, and gallium, the mixture containing at least one ternary mixed oxide of indium, zinc, and gallium and at least one amorphous phase. The portion of ternary mixed oxides of indium, zinc, and gallium is at least 50 weight percent, relative to the total weight of the mixture, and the portion of amorphous phase is at least 20 weight percent, relative to the total weight of the mixture.

Sputtering target having amorphous and microcrystalline portions and method of producing same

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Bruchköbel, Germany

Andreas Herzog