Carl-zeiss-smt Ag

Other

Andreas Heisler

Markus Weiss

Andreas Seifert

Wolfgang Singer

Frank Melzer

Stefan Dornheim

Hubert Holderer

Heinz Mann

Vadim Yevgenyevich Banine

Johannes Wangler

Bernd Kleemann

Berndt Warm

Karlfried Osterried

Jurgen Faltus

Jürgen Faltus

A faceted mirror apparatus includes a support plate having a plurality of stepped reception bores into which are fitted the base portions of respective ones of a plurality of mirror facets having mirrored surfaces. An outer surface of each of the facets bears on an inner wall to provide a stable alignment of the optical axes of the mirrored surfaces such that the apparatus generates a beam of rays from impinging rays.

Faceted mirror apparatus

A facet mirror () is provided with a number of mirror facets (), in which the mirror facets () respectively have a spherical or conical facet body () with a reflecting surface (). The side of the facet body () averted from the reflecting surface () is mounted in a bearing device ().

Facet mirror having a number of mirror facets

In a method for the production of a facetted mirrorhaving a plurality of mirror facetsand', which have mirror surfacesand are fitted into reception bores&#x2032; of a support platethe mirror facets&#x2032; are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet&#x2032; fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet&#x2032; in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Method for the production of a facetted mirror

In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

There is provided an illumination system for wavelengths of &lE;100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

Illumination system with a plurality of individual gratings

Growing community of inventors

Steinheim, Germany

Andreas Heisler