Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Andreas Frommeyer

Toralf Gruner

Heiko Feldmann

Sascha Bleidistel

Olaf Conradi

Wolfgang Hummel

Gerald Richter

Yim-Bun Patrick Kwan

Willi Heintel

Harald Kirchner

Wolfgang Keller

Jens Kugler

Bernhard Gellrich

Ulrich Weber

Bernhard Geuppert

Stefan Xalter

Franz Sorg

Johannes Lippert

Klaus Rief

Alexander Vogler

Alan L Brydon

Hans-Jürgen Scherle

Fraser G Morrison

Ernst-Dieter Knohl

Hermann Schubert

G Fraser Morrison

The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Method for improving the imaging properties of a projection objective, and such a projection objective

A damping device of an optical element of a projection exposure machine includes at least two mass dampers arranged spaced apart from one another, the vibration absorbers each having at least one damper mass and at least one damping element and the damper masses of the at least two mass dampers being interconnected by at least one connecting element. The optical element can be part of a projection exposure machine.

Damping device

The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (), wherein the projection objective has a plurality of lenses (L, L, L, L, L, L, L, L) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.

Reflecting optical element with eccentric optical passageway

In the case of a method of producing aspherical optical surfaces of optical elements (), in particular for use in microlithography for producing semiconductor elements, the optical element () is ground for example in the form of a meniscus. In a first method step, the optical element () is introduced into a basic form (), which has a spherical form bed and is being held at a distance over the form bed (). After that, an intermediate medium () is introduced in the basic form () between the optical element () and the form bed () and, subsequently the optical element () being removed together with the intermediate medium () from the basic form. Then, the spherical form bed () of the basic form () or a second basic form is transformed into an aspherical form bed (') computationally determined in advance. The optical element () is then re-introduced with the intermediate medium () into the basic form () or the second basic form, the intermediate medium () being sucked against the form bed (&#x2032;) by applying a vacuum. Subsequently, the optical element () deformed by the vacuum applied is spherically machined on a surface (). Finally, after removing the vacuum, the surface (&#x2032;) assumes the form of an aspherical surface.

Method of producing aspherical optical surfaces

An optical subassembly with an optical element, for example a mirror element (), has an optical surface () and bearing points () arranged on the circumference. The optical element () is connected to a mount () at the bearing points () via connecting elements (). Stress-decoupling cutouts, for example curved slots (), are provided between the optical surface () and the bearing points ().

Optical subassembly and projection objective in semiconductor lithography

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Aalen, Germany

Andreas Frommeyer