Basf Aktiengesellschaft

Andreas Boettcher

Gerd Rehmer

Reinhold Schwalm

Reinhard Aldag

Thomas Bluemel

Peter Neumann

Friedrich Seitz

Horst Binder

Martin Fischer

Michael Portugall

Manfred Schwartz

Gerhard Nestler

Gerhard Hoffmann

Eckehardt Wistuba

Oral Aydin

Gerhard Auchter

Bernd Bronstert

Lothar Franz

Friedrich-Wilhelm Raulfs

Bernhard Dotzauer

Peter Pfoehler

Helmut Jaeger

Reinhard Baecher

UV-crosslinkable materials based on (meth)acrylate copolymers and containing from 0.01 to 10% by weight, based on the copolymer, of copolymerized monomers of the formula I ##STR1## where x is alkyl of 1 to 3 carbon atoms or is phenyl which is unsubstituted or substituted by n Y groups, Y is --H, --CF.sub.3, --O-- alkyl and/or alkyl-COO--, where alkyl in each case is of 1 to 4 carbon atoms, halogen, --CH, --COOH or a non-ortho --OH group, n is from 0 to 4 and Z is a group of the formula ##STR2## where R is H or C.sub.1 -C.sub.4 -alkyl and A is an alkylene, oxaalkylene or polyoxaalkylene radical of 2 to 12 carbon atoms are used as hotmelt adhesives, for coating sheet-like mineral substrates and as surface coatings.

(Meth)acrylate copolymer based UV-crosslinkable materials

The invention relates to an aqueous polymer dispersion which may optionally contain mineral additives and/or pigments and which essentially consists of a mixture of

Aqueous polymer dispersions containing organic compounds having

The invention relates to UV-crosslinkable copolymers built up from

UV-crosslinkable copolymers

The invention relates to compounds containing carbonate groups and carbonyl groups and having the general formula ##STR1## in which R stands for a C.sub.1 -C.sub.4 -alkyl radical, an aryl radical, or a radical R.sup.1, where

Compounds containing carbonate groups and carbonyl groups and the

UV-crosslinkable materials based on (meth)acrylate copolymers and containing special modified unsaturated benzophenone derivatives as copolymerized units are used as hotmelt adhesives, for coating sheet-like mineral substrates and as surface coatings.

Benzophenone derivatives and their preparation

Radiation-sensitive, ethylenically unsaturated compounds and a process for their preparation. The ethylenically unsaturated organic compounds are of the general formula ##STR1## where R is alkyl, aryl or a radical R.sup.1 and

Radiation-senstive, ethylenically unsaturated, copolymerizable compounds

Novel sulfonium salts useful as photoinitiators for cationic polymerization and for producing relief patterns and relief images have the general formula (I) ##STR1## where A.sup..crclbar. is a non-nucleophilic counterion,

Sulfonium salts and use thereof

Sulfonium salts of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and are aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R.sup.1 and R.sup.3 are bonded to one another to form a ring, with the proviso that one or more of the radicals R.sup.1 to R.sup.3 contain one or more acid-cleavable groups, or one of the radicals R.sup.1 to R.sup.3 is bonded to one or more further sulfonium salt radicals, if desired via acid-cleavable groups, and X.sup..crclbar. is a non-nucleophilic counter-ion, are suitable as photoinitiators for cationic polymerization.

Sulfonium salts having acid-labile groups

Agents which are curable by ultraviolet radiation are based on a binder formulation of (1) from 99.0 to 20% by weight of a copolymer, (2) from 1.0 to 80% by weight of monoolefinically unsaturated compounds and (3) from 0.0 to 20% by weight of polyolefinically unsaturated compounds. The agents contain copolymers (1) which are obtainable by subjecting a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerizable olefinically unsaturated photoinitiator and (C) from 0 to 10% by weight of a polymerization-regulating photoinitiator to free radical polymerization, the sum of (B) and (C) being not less than 0.1% by weight and the stated percentages by weight being based on the sum of the weights of (A)+(B)+(C).

Agents curable by ultraviolet radiation

Radiation-sensitive polymers suitable for use in positive- and negative-working recording elements contain not only acid-labile groups but also onium salt groups having nonnucleophilic counterions in one and the same molecule.

Radiation-sensitive polymers

Radiation sensitive sulfonium salts which contain (1) a sulfonium initiator portion, (2) a spacer portion, and (3) a reactive group portion. The spacer portion has the formula '-o-w- x-z-' wherein 'w' is a single bond or one of --C(O)--, --C(O)O--, --C(O)S--, --C(O)NH-- --C(O)N(alkyl)--, --C(S)--, --C(S)S--,--S(O)--, --S(O)(O)--, or --S(O)(O)O--; 'X' is an unsubstituted or substituted alkylene radical; and 'Z' is --O--, --NH--, --N(C,--C.sub.6 -alkyl)--, or --N(phenyl)--. The reactive group portion is --CH.dbd.CH.sub.2 or --C(O)--C(Y).dbd.CH.sub.2 wherein 'Y' is H, C.sub.1 -.sub.6 -alkyl, or phenyl. The sulfonium salts find use in curing monomers which can be subjected to cationic polymerization.

Radiation-sensitive, ethylenically unsaturated, copolymerizable

Copolymers which are curable by ultraviolet radiation in the air are prepared by a process in which a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerizable olefinically unsaturated, photoreactive compound which, in the excited state produced by UV radiation, is capable of abstracting hydrogen and (C) from 0 to 10% by weight of a polymerization-regulating photoreactive compound which, in the excited state, is capable of abstracting hydrogen is subjected to free radical polymerization, the sum of (B) and (C) being not less than 0.1% by weight and the stated percentages by weight being based on the sum of the weights of (A)+(B)+(C).

Copolymers crosslinkable by ultraviolet radiation in the atmosphere

A radiation sensitive mixture suitable for producing relief patterns contains

Radiation-sensitive mixture containing acid labile groups and production

A radiation sensitive mixture useful for producing relief patterns contains

Radiation sensitive mixture and production of relief patterns

Materials which are cross-linkable by ultraviolet radiation under atmospheric oxygen and are based on (meth)acrylate copolymers having a K value of from 10 to 100 are obtained by free radical polymerization, in the presence or absence of a solvent, of

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Nussloch, Germany

Andreas Boettcher