Ri Research Institute Gmbh

Andreas Biermanns-Foeth

Thomas Missalla

Christoph Sebastian Phiesel

Christian Piel

Rainer Lebert

A microscope system for flexibly, efficiently and quickly inspecting patterns and defects on extreme ultraviolet (EUV) lithography photomasks. The system includes a stand-alone plasma-based EUV radiation source with an emission spectrum with a freestanding line emission in the spectral range from 12.5 nm to 14.5 nm has a relative bandwidth of &#x3bb;/&#x394;&#x3bb;&#x3e;1000, means for the broadband spectral filtering &#x3bb;/&#x394;&#x3bb;&#x3c;50 for selecting the dominant freestanding emission line, means for suppressing radiation with wavelengths outside of the EUV spectral region, zone plate optics for magnified imaging of the object with a resolution which corresponds to the width of an outermost zone of the zone plate, a numerical aperture corresponding to more than 1000 zones, and a EUV detector array for capturing the patterned object.

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Overath, Germany

Andreas Biermanns-Foeth