Carl Zeiss Smt Gmbh

Andreas Bertele

Jochen Weber

Peter Vogt

Martin Mahlmann

Benjamin Sigel

Peter Kloesch

The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Projection exposure apparatus for semiconductor lithography including an actuator system

Actuator arrangements are disclosed. An actuator arrangement can include a first fluidic-based actuator device designed to exert a first force on a first location of a body associated with the first actuator device. An actuator arrangement can also include a second fluidic-based actuator device designed to exert a second force on a second location of the body associated with the first actuator device. The distance between the first and second locations can be small. The maximum value of the second force can be less than the maximum value of the first force.

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Steinheim, Germany

Andreas Bertele