Vistec Semiconductor Systems Gmbh

Andre Schepp

Klaus Rinn

Andreas Schaaf

A method for determining the positions of structures () on a mask () is disclosed. The method is implemented in a metrology tool () comprising a measurement table () which is movable in X-coordinate direction and Y-coordinate direction. A first intensity profile (I) is recorded along a first measurement direction (MR), which is parallel to the X-coordinate direction. A second intensity profile (I) is recorded along a second measurement direction (MR), which is parallel to the Y-coordinate direction. A two-dimensional position of a centre of gravity (S) with respect to the coordinate system of the metrology tool () is determined from the first intensity profile (I) and the second intensity profile (I).

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Munich, Georgia

Andre Schepp