Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Andre Bresan

Heiko Siekmann

Johannes Wangler

Nils Haverkamp

Michael Gerhard

Michael Layh

Axel Scholz

Ralf Scharnweber

Siegfried Rennon

Stefan Burkart

Oliver Wolf

Eva Kalchbrenner

Holger Kierey

A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

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Aalen, Germany

Andre Bresan