Asml Netherlands B.v.

Andre Bernardus Jeunink

Yvonne Wendela Kruijt-Stegeman

Sander Frederik Wuister

Arie Jeffrey Den Boef

Hoite Pieter Theodoor Tolsma

Catharinus De Schiffart

Johannes Petrus Martinus Bernardus Vermeulen

Johan Frederik Dijksman

Hubertus Johannes Gertrudus Simons

Michael Jozef Mathijs Renkens

Norbert Erwin Therenzo Jansen

Ramon Navarro Y Koren

Richard Johannes Franciscus Van Haren

Engelbertus Antonius Fransiscus Van Der Pasch

Paul Christiaan Hinnen

Franciscus Bernardus Maria Van Bilsen

Jacobus Burghoorn

Gerard Van Schothorst

Henry Megens

Jeroen Huijbregtse

Sicco Ian Schets

Allan Reuben Dunbar

Hermanus Gerardus Van Horssen

Brian Young Bok Lee

Toon Hardeman

George Arie Jan De Fockert

Gregor Edward Van Baars

Vadim Yevgenyevich Banine

M'hamed Akhssay

Johannes Jacobus Matheus Baselmans

Wim Tjibbo Tel

Henricus Petrus Maria Pellemans

Bearrach Moest

Irwan Dani Setija

Thomas Poiesz

Stefan Carolus Jacobus Antonius Keij

Erik Roelof Loopstra

Hans Butler

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Emiel Jozef Melanie Eussen

Leon Martin Levasier

Adrianus Hendrik Koevoets

Siegfried Alexander Tromp

Yang-Shan Huang

Laurentius Johannes Adrianus Van Bokhoven

Marcel Koenraad Marie Baggen

Robbert Edgar Van Leeuwen

Carolus Johannes Catharina Schoormans

Stefan Geerte Kruijswijk

Johannes Adrianus Cornelis Maria Pijnenburg

Thomas Josephus Maria Castenmiller

Enno Van Den Brink

Frank Pieter Albert Van Den Berkmortel

Stan Henricus Van Der Meulen

Nicolaas Rudolf Kemper

Raymond Wilhelmus Louis Lafarre

Henrikus Herman Marie Cox

Johan Hendrik Klootwijk

Marc Wilhelmus Maria Van Der Wijst

Martinus Bernardus Van Der Mark

Erik Henricus Egidius Catharina Eummelen

Theodorus Petrus Maria Cadee

Jan Van Eijk

Roelof Koole

Martijn Houben

Emiel Peeters

Rogier Hendrikus Magdalena Cortie

Ruud Antonius Catharina Maria Beerens

Yuri Johannes Gabriël Van De Vijver

Robert-Han Munnig Schmidt

Jim Vincent Overkamp

Marcus Martinus Petrus Adrianus Vermeulen

Rene Theodorus Petrus Compen

Abraham Alexander Soethoudt

Youssef Karel Maria De Vos

Christianus Martinus Van Heesch

Dirk-Jan Bijvoet

Gijs Kramer

Willem Herman Gertruda Anna Koenen

Wilhelmus Henricus Theodorus Maria Aangenent

Peter Smits

Coen Hubertus Matheus Baltis

Ruediger Mauczok

Jacobus Bernardus Giesbers

Christianus Wilhelmus Johannes Berendsen

Jeroen Dekkers

Frank Auer

Fransiscus Mathijs Jacobs

Hendrikus Johannes Marinus Van Abeelen

Christiaan Louis Valentin

Bert Dirk Scholten

Mark Johannes Hermanus Frencken

Johannes Mathias Theodorus Antonius Adriaens

Suzanne Johanna Antonetta Geertruda Cosijns

Justin Johannes Hermanus Gerritzen

Henricus Martinus Johannes Van De Groes

Bas Jansen

André Schreuder

Richard Henricus Adrianus Van Lieshout

An object table including: a holding surface for holding an object; and an actuator arrangement configured to exert a holding force on the object for holding the object to the holding surface, wherein the actuator arrangement is further configured to decrease a strain in the object caused by the holding force by sequentially detaching and re-attaching portions of the object from the holding surface, while the object is held to the holding surface.

Object table, stage apparatus, holding method and lithographic apparatus

A method is provided for determining surface parameters of a patterning device, comprising the steps of: positioning the patterning device with respect to a path of an exposure radiation beam using a first measurement system, providing the patterning device at a first focal plane of a chromatic lens arranged in a second measurement system, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein the radiation comprises a plurality of wavelengths, determining a position of the illuminated part of the patterning device in a first and second direction, collecting at least a portion of radiation reflected by the patterning device through the chromatic lens, measuring an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information of the illuminated area, and determining the surface parameters of the patterning device at the determined position from the spectral information.

Measurement system and method for characterizing a patterning device

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Imprint lithography

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Lithographic apparatus, method for unloading a substrate and method for loading a substrate

A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

Support apparatus, a lithographic apparatus and a device manufacturing method

An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

Imprint lithography apparatus and method

A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

Lithographic method

A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

Support apparatus, lithographic apparatus and device manufacturing method

A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.

Methods for providing lithography features on a substrate by self-assembly of block copolymers

A lithographic apparatus comprising: a channel () for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (); a second material () between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material () between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

Lithographic apparatus and method of manufacturing a lithographic apparatus

A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

Growing community of inventors

Bergeijk, Netherlands

Andre Bernardus Jeunink