Danmarks Tekniske Universitet

Nil Technology Aps

Radiometer Medical Aps

The Chancellor, Masters and Scholars of the University of Oxford

Anders Kristensen

Christoph Vannahme

Niels Asger Mortensen

Emil Højlund-Nielsen

Theodor Kamp Nielsen

Xiaolong Zhu

Uriel Levy

Ole Hansen

Kalim Ullah Mir

Chen Zhou

Martin Dufva

Brian Bilenberg Olsen

Jesper Nørregaard

Kristian Tølbøl Sørensen

Kristian Smistrup

Emil Søgaard

Mehdi Keshavarz Hedayati

Rodolphe Marie

Kristian Hagsted Rasmussen

Emil HØJLUND-Nielsen

Kristian Tølbøl SØRENSEN

Theodor Nielsen

There is presented a method for geometrically modifying high-index dielectric structures on a support structure which includes steps of providing a support structure and a first plurality of high-index dielectric structures supported by the support structure. The method includes changing a geometry of the high-index dielectric structures within a second plurality of high-index dielectric structures, being a sub-set of the first plurality of high-index dielectric structures. The geometry is changed by photothermally melting some of the high-index dielectric structures within the second plurality of high-index dielectric structures by irradiating them with incident electromagnetic radiation, and thereby exciting resonances associated with each of the high-index dielectric structures within the second plurality of high-index dielectric structures. The support structure comprises a first plurality of topographical features and the first plurality of high-index dielectric structures are given by high-index dielectric structures on or in said topographical features and holes in a high-index dielectric film.

Photothermal modification of high index dielectric structures

A planar waveguide device (PWD) for interacting with a fluid (FLD) is disclosed, the planar waveguide device (PWD) comprising

Planar waveguide device with nano-sized filter

There is presented a method for geometrically modifying plasmonic structures on a support structure, such as for printing or recording, said method comprising changing a geometry specifically of plasmonic structures, wherein said changing the geometry is carried out by photothermally melting at least a portion of each of the plasmonic structures within the second plurality of plasmonic structures by irradiating, the plasmonic structures with incident electromagnetic radiation having an incident intensity in a plane of the second plurality of plasmonic structures, wherein said incident intensity is less than an incident intensity required to melt a film of a corresponding material and a corresponding thickness as the plasmonic structures within the second plurality of plasmonic structures.

Photothermal modification of plasmonic structures

Embodiments of the present invention include a cuvette () for use in determining a refractive index of a sample matter in a spectrophotometer (), the cuvette comprising a container () for holding the sample matter, the container () having an entry window () that allows input radiation to reach the sample matter, the container furthermore having an exit window () that allows a part of the input radiation to exit the container part, the entry window and the exit window defining a radiation path; and comprising a photonic crystal () rigidly attached to the container or integrally formed in the container and arranged in the radiation path, the photonic crystal having a grating part () causing a reflectance spectrum of the photonic crystal to exhibit a resonance. A spectrophotometer is also provided.

Cuvette and method for measuring refractive index in a spectrophotometer

A surface refractive index acquisition system for characterization of a sample is provided. The system comprises a grating device configured to receive the sample, and first and second grating regions. First and second grating periods are selected to provide optical resonances for light respectively in first and second wavelength bands. A light source is configured to illuminate part of the first and second grating regions simultaneously. An imaging system is configured to image light from the grating device and comprises an optical element focusing light in a transverse direction and being invariant in an orthogonal transverse direction, the optical element being oriented such that the longitudinal direction of the grating device is oriented to coincide with the invariant direction of the optical element, and an imaging spectrometer comprising an entrance slit having a longitudinal direction oriented to coincide with the invariant direction of the optical element.

Surface refractive index scanning system and method

The present invention relates to methods for embedded a micrometer and/or nanometer pattern into an injection molding tool. In a first main aspect, a micro/nanometer structured imprinting device is applied in, or on, an active surface so as to transfer the micro/nanometer patterned structure to the tool while the imprinting device is, at least partly, within a cavity of the injection molding tool. In a second main aspect, a base plate with a micro/nanometer structured pattern positioned on an upper part is positioned on the active surface within the tool, the lower part of the base plate facing the tool, the active surface receiving the base plate being non-planar on a macroscopic scale. Both aspects enable a simple and effective way of transferring the pattern, and the pattern may be transferred on the active working site of tool immediately prior to molding without the need for extensive preparations or remounting of the tool before performing the molding process.

Injection molding tools with micro/nano-meter pattern

The present invention relates to a nano-imprinting stamp for imprinting nanometer-sized to mm-sized structures, the stamp () having a base part and a first and a second imprinting section (), the first and second imprinting sections having a lithographic pattern () intended for imprinting in a receiving substrate. In a first aspect, the first and the second imprinting sections () are independently displaceable in a direction substantially parallel to an imprinting direction of the imprinting stamp. In a second aspect, the first and the second imprinting sections () are mechanically weakly coupled in a direction substantially parallel to an imprinting direction of the imprinting stamp. The stamp limits the effect of imperfections in or on the substrate to be imprinted with a lithographic pattern () and imperfections in or on the stamp and any combinations of such imperfections by localising the bending of the stamp to the base part () in-between the imprinting sections ().

Flexible nano-imprint stamp

Growing community of inventors

Frederiksberg C, Denmark

Anders Kristensen