Asml Netherlands B.v.

Andelko Katalenic

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Pieter Willem Herman De Jager

Andrey Alexandrovich Nikipelov

Gosse Charles De Vries

Olav Waldemar Vladimir Frijns

Wouter Joep Engelen

Leonardus Adrianus Gerardus Grimminck

Petrus Rutgerus Bartraij

Johannes Antonius Gerardus Akkermans

Teis Johan Coenen

Franciscus Johannes Joseph Janssen

Ramon Pascal Van Gorkom

Han-Kwang Nienhuys

Michael Jozef Mathijs Renkens

Borgert Kruizinga

Wilhelmus Patrick Elisabeth Maria Op 't Root

Rilpho Ludovicus Donker

Pieter De Jager

Wilhelmus Patrick Elisabeth Maria Op'T Root

Lucas Johannes Peter Ament

Petrus Bartraij

Leonardus Grimminck

Lucas Ament

Franciscus Janssen

Olav Frijns

Michael Renkens

A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Beam delivery apparatus and method

A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.

Electron injector and free electron laser

An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.

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Veldhoven, Netherlands

Andelko Katalenic