United Technologies Corporation

Anatoly Kuzmichev

Igor V Belousov

Yuriy G Kononenko

John F Mullooly, Jr

Robert L Memmen

Michael J Maloney

Richard S Mullin

Vadim Ivanovich Bondarchuk

Oleg G Pankov

Dmitriy Ryzhikov

Vladimir Biber

Leonid Shaginyan

Jr John F Mullooly

Jr John E Mullooly

An apparatus for depositing a coating on one or more parts () has: a chamber (); a part holder () for carrying the part(s); a bias voltage source () coupled to the part(s) to apply a bias voltage to the part(s); a source () of the coating material; a plurality of temperature sensors (); and a plurality of leads () passing outputs of the temperature sensors out from the chamber. A temperature monitoring system () has a temperature data processor (). At least one fiber optic link () couples the temperature data processor to the temperature sensors so as to electrically isolate the temperature data processor from the bias voltage.

Deposition substrate temperature and monitoring

A coated part is exposed to a gas flow. The gas flow has a characteristic gas flow direction distribution over a surface of the coated part. The coated part has a substrate having a substrate surface and a coating over the substrate surface. The coating comprises at least one coating layer. A first such layer is columnar and has a column boundary direction distribution. The column boundary direction distribution is selected for partial local alignment with the gas flow direction distribution.

Thermal barrier coatings and methods of application

A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises maintaining at least an ion current density in a range of 2-1000 mA/cm.

Ceramic coating deposition

Ion-enhanced physical vapor deposition is augmented by sputtering to deposit multi-component materials. The process may be used to deposit coatings and repair material on Ti alloy turbine engine parts. The physical vapor deposition may be ion-enhanced electron beam physical vapor deposition.

Multi-component deposition

A material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises a plurality of first steps for PA-PVD. Each of the first steps comprises a series of pulses of negative potential. The modulation further comprises a plurality of second steps for PVD alternating with the first steps.

Ion-enhanced physical vapor deposition is utilized to deposit repair material on Ti alloy turbine parts. Pulse modulation may be used to control a bias voltage and an ionization.

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Kyiv, Ukraine

Anatoly Kuzmichev