Entegris, Inc.

Extraction Systems, Inc.

Zentox Corporation

Mykrolis Corporation

Anatoly Grayfer

Oleg P Kishkovich

William M Goodwin

Devon A Kinkead

David Ruede

Elliot Berman

Jürgen Michael Lobert

John E Sergi

Mark C Phelps

Frank Vincent Belanger

A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalchols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

Filters employing both acidic polymers and physical-adsorption media

The present invention provides a filtering system for a semiconductor processing tool. In one embodiment, the filtering system is associated with the semiconductor processing tool. A system of the invention comprises a first and second filter layer in fluid communication with a gas flow path. The flow path is a gas stream comprising volatile silica containing compounds such as hexamethyldisiloxane and trimethylsilanol. The gas flow path passes through the first and second filter layer to fluidly communicate with the semiconductor processing tool. Preferably, the first filter layer of the filtering system is upstream along the gas flow path from the second filter layer. The medias of the first and second filter layers are selected and arranged based on given contaminant concentrations. The invention also provides a method for filtering gas containing hexamethyldisiloxane and trimethylsilanol in communication with a semiconductor processing tool, which employs a system comprising a first and second filter layer.

Filtering system for a semiconductor processing tool

The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.

Systems and methods for detecting contaminants

The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection and removal.

Air handling and chemical filtration system and method

The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.

System and method for monitoring contamination

A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

Methods using filters employing both acidic polymers and physical-adsorption media

A system and method for determining and removing contamination recognizes the need to determine contamination caused by a plurality of contaminants which includes refractory compounds, high molecular weight compounds and low molecular compounds operating at different rates. The system in accordance with a preferred embodiment of the present invention includes a collection device that emulates the environment of the surfaces of certain optical elements. The method for determining and preferably removing contamination includes maintaining an extended duration sampling time to enable the collection of a desirable mass of high molecular weight compounds. In a preferred embodiment, the collection device is operated past a breakthrough capacity to quantitatively measure high molecular weight compounds and other contaminants.

System and method for determining and controlling contamination

A semiconductor catalyst is metalized in situ on a reaction support surface by illuminating at least a portion of the catalyst in the presence of a suitable source of metal to selectively deposit the metal on the illuminated portions. The source of metal can be applied to the reaction support surface either with the catalyst or separately, but is not attached to the catalyst until the structure is illuminated. This causes the metal to be deposited where the catalyst will be illuminated during use and therefore where photopromoted catalytic degradation can occur.

In situ method for metalizing a semiconductor catalyst

A fibrous matte web is used to support a semiconductor catalyst for use in the photopromoted catalyzed degradation of compounds in a fluid stream. The catalyst, which may be a transition metal oxide, is affixed to at least one side of the matte web, and preferably the downstream side thereof. In one embodiment, the matte web is comprised of a plurality of fibers of glass or other suitable material permitting fluid to pass therethrough, and the side or sides containing the catalyst are directly illuminated by a suitable light source.

Growing community of inventors

Newton, MA, United States of America

Anatoly Grayfer