Kla-tencor Technologies Corporation

Amo Development, LLC

Kla Tencor Corporation

Amo Manufacturing Usa, LLC

Anatoly Fabrikant

Ady Levy

Walter Dean Mieher

Michael E Adel

Ian R Smith

Michael Friedmann

Dimitri A Chernyak

Mehrdad Nikoonahad

Guang-ming Dai

Mark Ghinovker

Noah Bareket

Boris Golovanesky

Christopher F Bevis

John Fielden

Andrei V Shchegrov

Daniel C Wack

Dan Wack

Piotr S Zalicki

Jayesh Shah

Guoheng Zhao

Thaddeus Gerard Dziura

Boris Golovanevsky

Paola Dececco

Kenneth P Gross

Ted Dziura

Guangming Dai

Ihor V Berezhnyy

Qi Wang

Benjamin A Logan

Paola deCecco

Henry Price

Anthony Tang

Stanley S Bentow

Ken Gross

Noam Knoll

Stephen Calebotta

David Hindi

Ben Logan

Ian Smith

Baruch Moshe

Embodiments of the present invention encompass systems and methods for generating a vision treatment target for an eye of a patient. Exemplary techniques can involve obtaining a wavefront measurement for the eye of the patient, processing the wavefront measurement, using a low pass filter, to obtain an ocular wavefront, and generating the vision treatment target based on the ocular wavefront. In some cases, the wavefront is processed by applying a Fourier transform to the wavefront measurement to obtain a Fourier spectrum of the wavefront, convolving, in the Fourier domain, the Fourier spectrum of the wavefront and the low pass filter to obtain a Fourier spectrum convolution result, and applying an inverse transform to the convolution result to obtain the ocular wavefront. The ocular wavefront can represent a low pass filtered version of the wavefront measurement, such that high spatial frequency features present in the wavefront measurement are not present in the ocular wavefront.

Wavefront measurement pre-smoothing systems and methods

Embodiments of the present invention generally describe systems, devices, and methods for directly measuring pulse profiles during pulse delivery. In some embodiment, the pulse profiles may be measured while the pulse is delivered to ablate a material. Embodiments, may calculate ablation spot parameters based on the pulse profiles and may refine one or more subsequent laser pulses based on deviations from the calculated ablation spot parameters from desired ablation spot parameters. In some embodiments, a fluence profiler is provided. The fluence profiler may measure a pulse profile of a laser pulse from a portion of the laser pulse. The fluence profiler may utilize a UV radiation energy sensor device and a camera-based imager. The measurements from the UV radiation energy sensor device and the camera-based imager may be combined and scaled to provide a measured pulse profile that corresponds to the delivered pulse.

Systems and methods for laser beam direct measurement and error budget

Embodiments of the present invention provide methods and systems for determining an ablation treatment for an eye of a patient. The systems and method may involve determining an ellipsoid shape corresponding to an anterior corneal surface of the patient's eye. The ellipsoid shape may include an anterior portion, a major axis, and an apex, where the major axis intersects the anterior portion at the apex. The systems and method may also involve determining a tilted orientation of the eye, such as when the patient fixates on a target during a laser ablation procedure. The systems and method may further involve determining the ablation treatment based on the ellipsoid shape and/or the tilted orientation.

Tilt compensation, measurement, and associated adjustment of refractive prescriptions during surgical and other treatments of the eye

Treatment validation techniques include generating a modified treatment target from an original treatment target using a modification process, and comparing induced aberrations provided by the original and modified treatment targets, so as to verify the modified treatment target or the modification process. In some cases, a modification process may include a deconvolution process, a low pass filter process, a scaling process, or an adjustment process. The induced aberrations may include high order aberrations, such as spherical aberration.

Treatment validation systems and methods

Embodiments of the present invention encompass systems and methods for customized vision treatments that account for effects associated with corneal flap creation.

Compensation systems and methods for flap induced aberrations

Deconvolution systems and methods based on cornea smoothing can be used to obtain an ablation target or treatment shape that does not induce significant high order aberrations such as spherical aberration. Exemplary ablation targets or treatment shapes can provide a post-operative spherical aberration that is equal to or below a naturally occurring amount of spherical aberration.

Systems and methods for treatment deconvolution using multi-scale kernels

Deconvolution systems and methods based on cornea smoothing can be used to obtain an ablation target or treatment shape that does not induce significant high-order aberrations such as spherical aberration. Exemplary ablation targets or treatment shapes can provide a post-operative spherical aberration that is equal to or below a naturally occurring amount of spherical aberration.

Systems and methods for treatment target deconvolution

Systems and methods for measuring a topography of an optical tissue surface of an eye are provided by combining a measured elevation of the surface with a priori information of the surface to provide an estimate of mean and covariance of post-measurement orthogonal polynomial sequence amplitudes associated with the surface, determining a variance of elevation of the surface from the estimate, and constructing the topography from the estimate of mean and covariance of post-measurement amplitudes based on a comparison of the variance of elevation of the surface with a pre-determined threshold. The a priori information includes an estimate of mean and covariance of pre-measurement orthogonal polynomial sequence amplitudes associated with the surface.

System and method for ophthalmic surface measurements based on objective quality estimation

Systems and methods for treatment deconvolution using dual scale kernels

Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a &#x2212;1diffraction order and a +1diffraction order. It is determined whether there are any overlay error between the first structures and the second structures using a scatterometry technique based on the detected spectra by (i) for each target, determining a first differential intensity between the &#x2212;1diffraction order and a +1diffraction order, (ii) for a plurality of pairs of targets each having a first target and a second target, determining a second differential intensity between the first differential intensity of the first target and the first differential intensity of the second target, and (iii) determining any overlay error between the first structures and the second structures using a scatterometry technique based on the second differential intensities determined from each target pair.

Apparatus and methods for detecting overlay errors using scatterometry

Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb.

A gallery of seed profiles is constructed and the initial parameter values associated with the profiles are selected using manufacturing process knowledge of semiconductor devices. Manufacturing process knowledge may also be used to select the best seed profile and the best set of initial parameter values as the starting point of an optimization process whereby data associated with parameter values of the profile predicted by a model is compared to measured data in order to arrive at values of the parameters. Film layers over or under the periodic structure may also be taken into account. Different radiation parameters such as the reflectivities R, Rand ellipsometric parameters may be used in measuring the diffracting structures and the associated films. Some of the radiation parameters may be more sensitive to a change in the parameter value of the profile or of the films then other radiation parameters. One or more radiation parameters that are more sensitive to such changes may be selected in the above-described optimization process to arrive at a more accurate measurement. The above-described techniques may be supplied to a track/stepper and etcher to control the lithographic and etching processes in order to compensate for any errors in the profile parameters.

Parametric profiling using optical spectroscopic systems

Growing community of inventors

Fremont, CA, United States of America

Anatoly Fabrikant