Intel Corporation

Anantha Subramani

Philip Allan Kraus

Kelvin Chan

Michael D Willwerth

Leonard Michael Tedeschi

Yaoling Pan

Ashish Goel

Patrick John Tae

Vijaykumar Krithivasan

Shimin Mao

Chih-shun Lu

Embodiments described herein include a resonant process monitor and methods of forming such a resonant process monitor. In an embodiment, the resonant process monitor includes a frame that has a first opening and a second opening. In an embodiment, a resonant body seals the first opening of the frame. In an embodiment, a first electrode on a first surface of the resonant body contacts the frame and a second electrode is on a second surface of the resonant body. Embodiments also include a back plate that seals the second opening of the frame. In an embodiment the back plate is mechanically coupled to the frame, and the resonant body, the back plate, and interior surfaces of the frame define a cavity.

Resonant process monitor

Growing community of inventors

Santa Clara, CA, United States of America

Anantha Subramani