Industrial Technology Research Institute

An-Tse Lee

Chien-Liang Huang

Tzuan-Ren Jeng

Wen-Yih Liao

Ching-Yu Hsieh

Hui-Ping Tsai

Shin-Shin Wang

Jong-Lieh Yang

Wen-Ping Chu

Ming-Chia Li

Ming-Chia Lee

Chien-Wen Chen

Chii-Chang Lai

Kuo-Chi Chiu

Chung-Ta Cheng

Tzung-Te Chen

Sheng-Li Chang

Jung-Po Chen

Chien-Ping Wang

Chin-Tien Yang

Ming-Fang Hsu

Sheng-Bang Huang

Shih-Chun Yang

An inspection system is provided, which applies a forward or reverse voltage on a light-emitting device and measures a current thereof respectively before and after temperature rise, and determines whether the device fails according to the fact whether a current difference before and after the temperature rise is larger than a failure current determination value. Alternatively, the inspection system adopts a current applying device to apply a forward and reverse current on a light-emitting device and measures a voltage difference thereof respectively before and after temperature rise, and determines whether the device fails according to the fact whether a difference of the voltage differences before and after the temperature rise is larger than a failure voltage determination value. Alternatively, the inspection system adopts a predetermined inspecting step and a rapid inspecting step respectively to determine whether a light-emitting device fails. An inspection method for the inspection system is also provided.

Inspection method

The invention provides dyes for optical disc recoding media, having the general formula: 

Dye and recording media utilizing the same

A preparation method of a dye incorporated in a recording layer for a high density optical recording medium, having the following general chemical structural formula (I): is provided.

Organic dye for recording layer and high density optical recording medium using the same

An indolestyryl compound. The indolestyryl compound has formula (I): 

Indolestyryl compound and high density recording media utilizing the same

A recording layer including a novel organic compound for a high density optical recording medium is provided. The information may be recorded on the recording layer at a 2&#xd7; speed or higher speed with a relatively lower writing power so that heat distribution of the recording layer in the irradiated area is not likely to become steep both in time and space. The organic compound incorporated in the recording layer has the following general chemical structural formula (I). 

Organic compound for recording layer for high speed recording of information and optical recording medium including the same

A recording layer including a novel dye for a high density optical recording medium, employing short wavelength laser source with a wavelength not longer than 530 nm for recording high density information and reproduction/playback of the high density information recordings, is provided. The dye incorporated in the recording layer has the following general chemical structural formula (I): 

A bisstyryl compound. The bisstyryl compound has formula (I): 

Bisstyryl compound and high density recording media utilizing the same

A recording layer including a novel dye for a high density optical recording medium, employing short wavelength laser source with a wavelength no longer than 530 nm 530 nm for recording high density information and reproduction/playback of the high density information recordings, is provided. The dye incorporated in the recording layer has the following general chemical structural formula (I): 

An inorganic resist material is provided, which is an incomplete oxide of a phase-change material. The oxygen content in the inorganic resist material is lower than the stoichiometric oxygen content of a complete oxide of the phase-change material, and a general formula of the inorganic resist material is AO, in which A represents the phase-change material, and x is between 5 at. % and 65 at. %. The inorganic resist material can be used to form line patterns or recording pits with size smaller than the exposure light spot by using the laser of conventional lithography process as an exposure source.

Growing community of inventors

Taipei County, Taiwan

An-Tse Lee