Second Sight Medical Products, Inc.

Doheny Eye Institute

Amy Hines

Robert Jay Greenberg

Dao Min Zhou

Mark Salman Humayun

James Singleton Little

Arup Roy

Matthew J McMahon

Rongqing Dai

Sumit Yadav

Alan Matthew Horsager

James David Weiland

Ione Fine

Alan Horsager

Jone Fine

James David Welland

Matthew Mcmahon

Mark S Humayun

The invention is a method of identifying a preferred location for an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject and array location to array location. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the preferred location. Alternatively, electrode height may be measured directly to predict the preferred location.

Locating a neural prosthesis using impedance and electrode height

The invention is a method of automatically adjusting an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the threshold of perception. Alternatively, electrode height may be measured directly to predict the threshold of perception. Also, impedance measurement may be used to quickly identify defective electrodes and proper electrode placement.

Fitting a neural prosthesis using impedance and electrode height

The invention is a process for cathodic protection of electrodes wherein negative bias is applied on the electrode. The negative bias is obtained by asymmetric current pulse, which is obtained by negative phase pulsing with higher amplitude than that of the anodic phase. The asymmetric current pulse is obtained by negative phase pulsing with wider pulse width than that of the anodic phase. The asymmetric current pulse may also be obtained by negative phase pulsing with both higher amplitude and wider pulse width than that of the anodic phase. The invention further relates to a process for cathodic protection of electrodes, wherein negative bias is applied on the electrode, and the negative bias is obtained by asymmetric current pulse, where the asymmetric current pulse is obtained by negative phase pulsing with wider pulse width than that of the anodic phase. The wider pulse width is obtained by pulse trains.

Process for cathodic protection of electrode material

The present invention relates to a process for cathodic protection of electrode or electrode materials wherein negative bias is applied on the electrode. the negative bias is obtained by asymmetric current pulse. The asymmetric current pulse is obtained by performing negative phase with higher amplitude. The asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The asymmetric current pulse is obtained by performing negative phase with higher amplitude and with wider pulse width than that of the anodic phase. The present invention further relates to a process for cathodic protection of electrode or electrode materials, wherein negative bias is applied on the electrode, wherein the negative bias is obtained by asymmetric current pulse, wherein the asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The wider pulse width is obtained by pulse trains.

Process for cathodic protection of electrode materials

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Monterey Park, CA, United States of America

Amy Hines