Nanometrics Inc.

Orlucent, Inc.

Other

Onto Innovation Inc.

Shachaf, Catherine M.

Shachaf, Amit

Amit Shachaf

Catherine M Shachaf

Pedro Vagos

Barry J Blasenheim

Michael Elad

Daniel T Thompson

Steven G Hummel

Andrzej Buczkowski

John F Lesoine

Tom Walker

Nicolas Laurent

Methods, compositions and systems are provided for the imaging of cavity/tissue lesions, including without limitation cavity/tissue malignant lesions, e.g. cancers of the skin, mouth, colon, digestive system cervix, bladder, lung, etc.

System for imaging lesions aligning tissue surface

The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system. The focusing system uses an image of the light reflected from the measurement spot to determine a best focal position at a desired position of the sample. The focusing system selects a characteristic of reflected light, such as polarization state or wavelengths, to use for focusing. The characteristic of the reflected light that is selected for use in determining focal position is affected different by different portions of the sample. For example, light reflected from a top surface of a sample may have a different characteristic than light reflected by an underlying layer. The selected characteristic of the reflected light is used by the focusing system to focus the measurement spot at the top surface or an underlying layer of the sample.

Focus system for oblique optical metrology device

System for imaging lesions aligning tissue surfaces

Methods and compositions are provided for the analysis of skin surfaces to determine the presence of neoplastic tissue. In the methods of the invention, a composition comprising a florescent probe that binds to a specific neoplasia associated marker is applied topically to the area of interest. After topical administration, the probe preferentially binds to markers associated in neoplastic lesions in situ, which binding is detected with a compact illumination unit that provides illumination at a wavelength appropriate for image acquisition. The illumination unit comprises a light source and fiber optic bundle to direct the light towards the area of examination. A detection unit is used to capture and record an image of the area of investigation. The detection unit may be a digital camera, film camera, etc. A mapping module may also be provided to catalogue the site of examination.

Diagnostic system for the detection of skin cancer

The effective spot size of a spectroscopic metrology device is reduced through deconvolution of a measurement spectra set acquired from a measurement target combined with a training spectra set obtained from a training target. The measurement spectra set may be obtained using sparse sampling of a grid scan of a measurement target. The training spectra set is obtained from a grid scan of a training target that is similar to the measurement target. The training spectra set and the measurement spectra set include spectra from different grid nodes. Deconvolution of the measurement spectra and the training spectra sets produces an estimated spectrum for the measurement target that is an estimate of a spectrum from the measurement target produced with incident light having an effective spot size that is smaller than the actual spot size. One or more characteristics of the measurement target may then be determined using the estimated spectrum.

Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device

An optical metrology device, such as an ellipsometer, includes a focusing system that adjusts the focal position of the metrology device in real time so that focus may be maintained during movement of the measurement locations on the sample, e.g., using closed loop control. A filtered focus signal may be used to adjust the focal position while moving to a measurement location. Additionally, the focus signal may be coarsely filtered and finely filtered, where a coarse filtered focus signal is used to adjust the focal position while moving to a measurement location and a fine filtered focus signal is used to adjust the focal position when at the measurement location. An open loop control may be used in which once at the measurement location, a filtered focus signal is used to adjust the focal position when the filtered focus signal has no offset with respect to the focus signal.

Focusing system with filter for open or closed loop control

An ellipsometer includes an integrated focusing system with a beam splitter between the sample and the ellipsometer detector. The beam splitter provides a portion of the radiation to a lens system that magnifies any deviation from a best focus position by at least 2&#xd7;. The focusing system includes a 2D sensor, where the spot of light focused on the sensor is 50 percent or smaller than the sensor. The focusing system may further include a compensator to correct optical aberrations caused by the beam splitter. A processor receives an image signal and finds the location of the spot from which focus error can be determined and used to correct the focal position of the ellipsometer. The processor compensates for movement of the spot caused by rotating optics. Additionally, a proportional-integral-derivative controller may be used to control exposure time and/or gain of the camera.

Ellipsometer focusing system

A method for using photoluminescence to identify defects in a sub-surface region of a sample includes performing a first probe of the sample. A first data set, based on the first probe, is produced indicating defects located primarily in a surface layer of the sample. A second data set, based on a second probe, is produced indicating defects located in both the surface layer and a sub-surface region of the sample. The first data set is subtracted from the second data set to produce a third data set indicating defects located primarily in the sub-surface region of the sample. The first data set may optionally be normalized relative to the second data set before performing the subtraction. The first and second probes may advantageously be performed using a first laser and a second laser, respectively, having different wavelengths from each other.

Differential wavelength photoluminescence for non-contact measuring of contaminants and defects located below the surface of a wafer or other workpiece

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Palo Alto, CA, United States of America

Amit Shachaf