Raytheon Company

Amanda S Rickman

James S Wilson

Alex E Ockfen

James R Smith

Adolfo Lozano, Iii

Embodiments of the invention are directed to a deposition chamber for forming a poly-para-xylylene film. A non-limiting example of the deposition chamber includes a chamber body, an inlet coupling the chamber body to a furnace, and an outlet coupling the chamber body to a vacuum pump. The deposition chamber includes at least one heating element arranged on a surface of the chamber body. The heating element is configured to raise an internal temperature of the deposition chamber body to a substantially uniform internal temperature across an entire internal volume of the chamber body.

Uniform thin film deposition for poly-p-xylylene

An apparatus includes a heat sink configured to receive thermal energy from one or more heat sources. The heat sink includes a local reservoir configured to hold a liquid coolant, and the heat sink is configured to pass the thermal energy into the liquid coolant in the local reservoir in order to vaporize at least some of the liquid coolant. The apparatus also includes a membrane configured to allow vaporized coolant to pass through the membrane out of the local reservoir into an ambient environment and to prevent unvaporized coolant from passing through the membrane. The membrane is thereby configured to provide passive flow control for the liquid coolant. The membrane could include a vapor-permeable and liquid-repelling membrane. The membrane can also be configured to hold the liquid coolant in the local reservoir against one or more surfaces of the heat sink.

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Garland, TX, United States of America

Amanda S Rickman