Hitachi Global Storage Technologies Netherlands B.v.

Western Digital Technologies, Inc.

Hgst Netherlands, B.v.

International Business Machines Corporation

Hitachi Gobal Storage Technologies Inc.

Amanda Baer

Aron Pentek

Vladimir Nikitin

Wen-Chien David Hsiao

Edward Hin Pong Lee

Michael R Feldbaum

Ming Jiang

Donald Giles Allen

Yi Zheng

Sue Siyang Zhang

Hung-Chin Guthrie

Hamid Balamane

Trevor W Olson

Katalin Pentek

Yuan Yao

Quang Le

Jeffrey Scott Lille

Neil Leslie Robertson

Yimin Hsu

Tsung Yuan Chen

David Patrick Druist

Yinshi Liu

Daniel Wayne Bedell

John I Kim

Eric James Lee

Peter Beverley Powell Phipps

Florence Eschbach

Francisco Martin

Zheng Gao

Zhigang Bai

Cherngye Hwang

James Mac Freitag

Kim Yang Lee

Richard Hsiao

Yingjian Chen

Liubo Hong

Petrus Antonius Van Der Heijden

Hugo Alberto Emilio Santini

Alexander Goncharov

Jui-lung Li

Muhammad Asif Bashir

Yunfei Ding

Douglas Johnson Werner

Jyh-Shuey Jerry Lo

Susumu Okamura

James Terrence Olson

Frederick Hayes Dill

Hong Xu

Marie-Claire Cyrille

Nian Xiang Sun

Honglin Zhu

Yongchul Ahn

Clinton David Snyder

Fenglin Liu

Andrew Chiu

Hicham Moulay Sougrati

Kyusik Shin

John Jaekoyun Yang

Qiping Zhong

Edward H P Lee

Benjamin Lu Chen Wang

Aaron Neuhaus

Wipul Pemsiri Jayaekara

John Bruce Piggott, Jr

Yvette Winton

The present disclosure is generally related to a magnetic recording device comprising a magnetic recording head having a current flow in a cross-track direction around a main pole. The magnetic recording device comprises a main pole disposed between a trailing shield, a leading shield, and side shields. A trailing gap is disposed between the main pole and the trailing shield. A hot seed layer is disposed between the trailing gap and the trailing shield. A first insulation layer is disposed between the hot seed layer and the trailing shield, where the first insulation layer contacts the side shields. A second insulation layer is disposed between the main pole and leading shield, where the second insulation layer contacts the side shields. The first and second insulation layers direct the current through the side shields and across the main pole in a cross-track direction.

Cross track current design for energy assisted magnetic recording

In one embodiment, a write head includes a spin polarization layer (SPL) over a seed layer. A spacer layer is over the SPL. A trailing shield is over the spacer layer. The spacer layer forms a first interface between the spacer layer and the trailing shield and forms a second interface between the spacer layer and the SPL. The first interface has an area larger than an area of the second interface. In another embodiment, a write head includes a SPL over a spacer layer. A capping layer is over the SPL. A trailing shield is over the capping layer. The spacer layer forms a first interface between the spacer layer and the main pole and forms a second interface between the spacer layer and the SPL. The first interface has an area larger than an area of the second interface.

Spintronic devices with narrow spin polarization layers

A method in one embodiment includes forming a layer of a nonmagnetic material above an upper surface of a substrate; forming a resist structure above the layer of nonmagnetic material, wherein the resist structure has an undercut; removing a portion of the layer of nonmagnetic material not covered by the resist structure; depositing a layer of magnetic material above the substrate adjacent a remaining portion of the layer of nonmagnetic material such that at least portions of the layer of magnetic material and the remaining portion of the layer of nonmagnetic material lie in a common plane; removing the resist structure; and forming a write pole above the layer of magnetic material and the remaining portion of the layer of nonmagnetic material. Additional methods are also presented.

Methods for creating a stepped perpendicular magnetic pole via milling and/or metal liftoff

A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.

Magnetic write head manufactured by an enhanced damascene process producing a tapered write pole with a non-magnetic spacer and non-magnetic bump

A method in one embodiment includes forming a resist structure above an upper surface of a substrate, wherein a portion of the upper surface of the substrate is a shaping layer, wherein the resist structure has an undercut; depositing a layer of magnetic material above exposed regions of the substrate, wherein a portion of the layer of magnetic material tapers towards the substrate as it approaches the undercut; removing the resist structure; and forming a write pole above the layer of magnetic material. Additional methods are disclosed.

Methods for creating slanted perpendicular magnetic pole via metal liftoff

A method for manufacturing a magnetic write head having a stepped, recessed, high magnetic moment pole connected with a write pole. The stepped pole structure helps to channel magnetic flux to the write pole without leaking write field to the magnetic medium. This allows the write head to maintain a high write field strength at very small bit sizes. The method includes depositing a dielectric layer and a first CMP layer over substrate that can include a magnetic shaping layer. A mask is formed over the dielectric layer, the mask having an opening to define the stepped pole structure. The image of the mask is transferred into the dielectric layer. A high magnetic moment material is deposited and a chemical mechanical polishing is performed to planarize the magnetic material and dielectric layer.

Method for creating a magnetic write pole having a stepped perpendicular pole via CMP-assisted liftoff

Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.

Magnetic write pole fabrication

Systems and methods for enhanced planarization liftoff structures. In accordance with a first method embodiment, a method for manufacturing a pole tip for magnetic recording comprises accessing a wafer comprising a plurality of pole tips and a plurality of pole tip masks corresponding to the plurality of pole tips. Non magnetic material is filled adjacent to the plurality of pole tips. Material adjacent to the plurality of pole tips is etched. Subsequent to the etching, the wafer is planarized to a level equal to or higher than a level of the trailing edges of the plurality of pole tips. The enhanced liftoff structure enables decreased planarization processing, resulting in a decreased process window. As a beneficial result, manufacturing throughput and quality are improved.

Enhanced planarization liftoff structure and method for making the same

Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterned prior to CMP. Patterned stop layers produce the highest yields.

Methods for the manufacture of notched trailing shields

A perpendicular magnetic recording write head has a write pole, a trapezoidal-shaped trailing shield notch, and a metal gap layer between the write pole and notch. The write pole has a trailing edge that has a width substantially defining the track width and that faces the front edge of the notch but is spaced from it by the gap layer. The write head is fabricated by reactive ion beam etching of a thin mask film above the write pole to remove the mask film and widen the opening at the edges of the write pole. The gap layer and notch are deposited into the widened opening above the write pole. The write pole has nonmagnetic filler material, such as alumina, surrounding it except at its trailing edge, where it is in contact with the gap layer, which is formed of a different material than the surrounding filler material.

Method of manufacturing a perpendicular magnetic recording write head with notched trailing shield

A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.

Method to planarize perpendicular write poles using a combination of CMP and reactive ion milling

An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.

Optical lapping guide for use in the manufacture of perpendicular magnetic write heads

A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the transfer layer. In alternative embodiments an oversized trench is formed in the target area prior to the deposition of the transfer layer. The alignment marks can fabricated in the layer(s) deposited by the existing process or alternatively, the original layers can be removed and replaced with a layer of material selected to have comparable etching properties (definition layer).

Method for enhancing wafer alignment marks

A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE&#xae;. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge

A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.

High milling resistance write pole fabrication method for perpendicular recording

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Campbell, CA, United States of America

Amanda Baer