Carl Zeiss Smt Gmbh

Asml Netherlands B.v.

Carl Zeiss Meditec Ag

Almut Czap

Dirk Heinrich Ehm

Stefan-Wolfgang Schmidt

Hin Yiu Anthony Chung

Dieter Kraus

Stefan Wiesner

Stefan Koehler

Wolfgang Singer

Johannes Hubertus Josephina Moors

Stefan Hembacher

Juergen Fischer

Luigi Scaccabarozzi

Armin Werber

Jacques Cor Johan Van Der Donck

Jan Buchheister

Norbert Muehlberger

Yim-Bun-Patrick Kwan

André Wolfstein

Arnoldus Jan Storm

Hristina Srbinoska

Mona Nagel

Jetske Karina Stortelder

Marijn Sandtke

Maria Isabel Catalina Caballero

Sebastian Schall

Stefan Troeger

Provided is an eye implant having a lens sheath which is embodied for insertion in a capsular bag of an eye, is elastic, delimits a cavity in its interior and has a through hole via which the cavity is accessible from outside of the lens sheath, a plurality of reservoirs which are fastened to the lens sheath, project from the lens sheath to the outside, have an adhesive in their interior and are embodied to dispense the adhesive when pressed against the capsular bag, and at least two adapters which are fastened to the lens sheath, project from the lens sheath into the interior, and are embodied to engage with a respective haptic of an accommodative intraocular lens.

Eye implant for an accommodative intraocular lens

A source hollow body serves for predefining a plasma chamber for a section of a source plasma of an EUV plasma light source. The hollow body has at least one chamber wall that delimits the plasma chamber. The chamber wall has a multilayer construction. This results in a source hollow body that improves the practical usability of an EUV plasma light source equipped with the source hollow body.

Source hollow body and EUV plasma light source comprising such a source hollow body

In order to clean optical components () inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, () arranged to apply an electric and/or magnetic field, downstream of the heating filament () in the direction of flow of the hydrogen (). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam ().

Cleaning module, EUV lithography device and method for the cleaning thereof

The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.

Actuator including magnet for a projection exposure system and projection exposure system including a magnet

An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device () for processing an optical element (), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (), the processing device () includes a particle generator () for generating a particle beam, in particular an electron beam (), and/or a high-frequency generator.

EUV lithography device and method for processing an optical element

An optical assembly is mounted in a projection exposure apparatus () for EUV microlithography and includes at least one vacuum chamber (), at least one optical element () arranged in the vacuum chamber (), the optical element () having an optical surface () arranged to be impinged upon by a useful beam bundle () of the projection exposure apparatus (), and a cleaning device () configured to clean the optical surface (). The cleaning device () is configured to perform particle cleaning of the optical surface () at a gas pressure within the vacuum chamber () which is higher than a vacuum pressure (p) for performing an exposure operation with the projection exposure apparatus (). As a result, optical elements having respective optical surfaces arranged to be impinged upon by a useful beam bundle can be cleaned reliably of foreign particles.

Particle cleaning of optical elements for microlithography

Growing community of inventors

Aalen, Germany

Almut Czap