Taiwan Semiconductor Manufacturing Comp. Ltd.

Allen Hsia

Shih-Ming Chang

Wen-Chuan Wang

Chi-Lun Lu

Chang-Cheng Hung

Hung Chang Hsieh

Yen-Bin Huang

A method for patterning a substrate includes forming a material layer on the substrate; performing a first etching on the material layer to form a pattern; measuring the pattern of the material layer using an optical spectrum metrology tool; determining whether the measuring indicates that the etching step achieved a predefined result; and producing an etching recipe and performing a second etching of the material layer using the etching recipe if the predefined result was not achieved.

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Hsin-Chu, Taiwan

Allen Hsia