Applied Materials, Inc.

Allen Fox

Mark William Curry

Jennifer Y Sun

Peter I Porshnev

Sebastien Raoux

Robbert M Vermeulen

Semyon L Kats

Shaun W Crawford

Youssef A Loldj

James Douglas Dempster

Daniel S Brown

Rene T Correa

William D Pyzel

Barry Page

An abatement system is provided which includes 1) an abatement unit adapted to abate effluent; and 2) an ambient air supply system. The ambient air supply system includes an air moving device, wherein the ambient air supply system is adapted to supply ambient air to the abatement unit for use as an oxidant. Numerous other aspects are provided.

Apparatus and methods for ambient air abatement of electronic manufacturing effluent

In one aspect of the invention, a method for the improved operation of an electronic device manufacturing system is provided. The method includes providing information to an interface coupled to an electronic device manufacturing system having parameters, processing the information to predict a first parameter, and providing an instruction related to at least a second parameter of the electronic device manufacturing system wherein the instruction is based on the predicted first parameter. Numerous other aspects are provided.

Methods and apparatus for improving operation of an electronic device manufacturing system

An electrostatic chuck has an electrode embedded in a dielectric which is mounted on a pedestal. The dielectric has a contact surface with an average surface roughness of less than about 0.5 &#x3bc;m, a surface peak waviness of less than about 0.12 &#x3bc;m, and a surface peak waviness material ratio of greater than about 20%. The surface texture can be formed by lapping the dielectric surface with a slurry of abrasive particles.

Electrostatic chuck having textured contact surface

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Sunnyvale, CA, United States of America

Allen Fox