Asml Netherlands B.v.

Allan Reuben Dunbar

Sicco Ian Schets

Richard Johannes Franciscus Van Haren

Andre Bernardus Jeunink

Paul Christiaan Hinnen

Hubertus Johannes Gertrudus Simons

Franciscus Bernardus Maria Van Bilsen

Hoite Pieter Theodoor Tolsma

Jacobus Burghoorn

Henry Megens

Jeroen Huijbregtse

Ramon Navarro Y Koren

Hermanus Gerardus Van Horssen

Johny Rutger Schuurhuis

Brian Young Bok Lee

Jeroen Huijbregstse

Nicolaas Petrus Van Der Aa

An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Alignment systems and methods for lithographic systems

A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.

Method for position determination, method for overlay optimization, and lithographic projection apparatus

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Allan Reuben Dunbar