E.i. Dupont De Nemours and Company

Allan E Nader

Paul E Aldrich

Thaliyil V Rajanbabu

Philip Manos

Negative photoresists, and electronic devices comprising dielectric polyimide films resulting from such photoresists. The Photoresists comprise polyamic acids, which have been neutralized with tertiary amines containing double bonds of the acrylic family, the amines including acrylamines, alkylacrylamines such as for example methacrylamines, ethacrylamines, and the like. Also methods of making such amines in high purity.

Negative photoresists containing aminoacrylate salts

The present invention provides a process for the preparation of alkoxycarbonyloxystyrene comprising reacting acyloxystyrene with a strong base to yield a phenolate to which is added an alkoxycarbonylating agent in an organic solvent and a phase transfer catalyst to yield the desired product in the organic phase.

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Wilmington, DE, United States of America

Allan E Nader