L'oreal

Aline Aude Guimont

Chunhua Li

Daniella Cristina Gonzalez-Toro

Hy Si Bui

XianZhi Zhou

Andrea E Schott

Chaitrali Makarand Gothe

Jean-Thierry Simonnet

Ronni Lynn Weinkauf

Ramakrishnan Hariharan

Christopher Michael MacNeill

Tsang-Min Huang

Ruisong Xu

Allen Sha

Christopher John Tarling

Hubert Tunchiao Lam

Derek James Henry

Andrea E Schlather

Rong Dong

Marta Wolska-Brys

Alison Jeanne Scorese

Disclosed is an unpigmented cosmetic composition for treatment of keratin materials, which includes at least one cosmetic butter and at least one styrenic film former. Also disclosed are methods of use for the unpigmented cosmetic composition, either as by itself, or as a primer for a pigmented cosmetic composition.

Cosmetic composition for eyelashes

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Compositions comprising solvent, a monoalcohol, glycerin, and thickener

Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.

Compositions for removing nail polish

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.

Compositions comprising acetone, a monoalcohol, glycerin, and cellulose thickener

The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

Compositions comprising solvent, a monoalcohol and glycerin

The present invention relates to a nail composition containing at least one adhesive agent, at least one primary film former and at least one plasticizer.

Nail composition containing adhesive agent, primary film former and plasticizer

The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.

Nail polish removing composition

The invention relates to compositions for removing nail polish including at least about 20% by weight of a C2-C3 monoalcohol, at least about 10% by weight of glycerin, and a diester of a dicarboxylic acid. The compositions optionally include water. The water, if present, is present in a concentration by weight that is less than the concentration by weight of glycerin. If the concentration of glycerin is from 30% to 60% by weight, then the concentration of C2-C3 monoalcohol is at least about 30% by weight.

Compositions comprising glycerin, monoalcohol and a diester

The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

The invention relates to compositions for removing nail polish comprising a C2-C3 monoalcohol, glycerin, and propylene carbonate, wherein the glycerin and propylene carbonate are present in a glycerin to propylene carbonate ratio by weight of at least 1:3 and the concentration by weight of ethanol is at least about 16%. Methods of removing nail polish and moisturizing the hands are also provided.

The invention relates to photocurable compositions comprising at least one inorganic gelling agent.

Growing community of inventors

Westfield, NJ, United States of America

Aline Aude Guimont