Fei Comapny

Ali Mohammadi-Gheidari

Alexander Henstra

Peter Christiaan Tiemeijer

Gerard Nicolaas Anne Van Veen

Luigi Mele

Pieter Kruit

Pleun Dona

Gregory A Schwind

Kun Liu

Eric Gerardus Theodoor Bosch

Hendrik Nicolaas Slingerland

Bohuslav Sed'a

Ivan Lazic

Erik Rene Kieft

Erik René Kieft

Maarten Bischoff

Gerbert Jeroen Van De Water

Marek Uncovský

Eric Gerardus Bosch

Ivan Lazić

Gerard Van Veen

Tomas Radlicka

Van Gerard Nicolaas Anne Veen

Uncovsky Marek

Compact correctors for correcting spherical aberrations of a particle-optical lens in a charged particle microscope system, according to the present disclosure a strong hexapole configured to generate a strong hexapole field when a voltage is applied to it, and a weak hexapole positioned between the strong hexapole and a sample. The strong hexapole is positioned such that the crossover of a charged particle beam of the charged particle system does not pass through the center of the strong hexapole, such that the strong hexapole field applies at least an A2 aberration and a D4 aberration to the charged particle beam. The weak hexapole is further positioned or otherwise configured such that, when a voltage is applied to the weak hexapole it generates a weak hexapole field that applies at least a combination A2 aberration and a combination D4 aberration to the charged particle beam of the charged particle microscopy system.

Simple spherical aberration corrector for SEM

Optical corrector modules for charged particle columns can include at least one split multipole that includes two multipoles separated by a distance less than 10 mm. Each of the individual multipoles may include at least two electrodes positioned to partially define a beam path through the multipole. Each of the electrodes can include a first surface that faces upstream of a charged particle beam when used in the charged particle column and a second surface that faces downstream of the charged particle beam when used in the charged particle column. The thickness between the first surface and the second surface for each of the electrodes may be less than 10 mm. The split multipoles may be electrostatic and may correspond to hexapoles.

The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen; a source for producing a beam of charged particles; and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and directing said plurality of charged particle beamlets onto said specimen. According to the disclosure, the illuminator comprises a multi-aperture lens plate having a plurality of apertures for defining the corresponding plurality of charged particle beamlets; as well as at least a first electrode for generating an electrical field at a surface of the multi-aperture lens plate. The apertures in said multi-aperture lens plate have a noncircular cross-sectional shape to correct for neighbouring aperture induced aberrations. This allows for decreased spot size, and with this imaging resolution of the device is increased.

Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets

An electron optical module for providing an off-axial electron beam with a tunable coma, according to the present disclosure includes a structure positioned downstream of an electron source and an electron lens assembly positioned between the structure and the electron source. The structure generates a decelerating electric field, and is positioned to prevent the passage of electrons along the optical axis of the electron lens assembly. The electron optical module further includes a micro-lens that is not positioned on the optical axis of the electron lens assembly and is configured to apply a lensing effect to an off-axial election beam. Aberrations applied to the off-axial electron beam by the micro-lens and the electron lens assembly combine so that a coma of the off-axial beam has a desired value in a downstream plane.

Electron optical module for providing an off-axial electron beam with a tunable coma

An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first and second optical elements arranged on opposing sides of a sample plane, a third optical element arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.

Magnetic field free sample plane for charged particle microscope

A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.

Multi-electron-beam imaging apparatus with improved performance

A charged particle imaging apparatus comprising:

Multi-beam charged particle imaging apparatus

Techniques for multi-beam scanning transmission charged particle microscopy are disclosed herein. An example apparatus at least includes a charged particle beam column to produce a plurality of charged particle beams and irradiate a specimen with each of the plurality of charged particle beams, and an imaging system to collect charged particles of each of the charged particle beams of the plurality of charged particle beams that traverse the specimen during said irradiation, and to direct each charged particle beam of the plurality of the charged particle beams after traversing the sample onto a detector, where each charged particle beam includes a barycenter, and where the detector is disposed in an intermediate location between a back focal plane and an imaging plane of the imaging system.

Multi-beam scanning transmission charged particle microscope

A method of operating a charged particle microscope comprising the following steps:

Emission noise correction of a charged particle source

A charged particle microscope and a method of operating a charged particle microscope are disclosed. The microscope employs a source for producing charged particles, and a source lens below the source to form a charged particle beam which is directed onto a specimen by a condenser system. A detector collects radiation emanating from the specimen in response to irradiation of the specimen by the beam. The source lens is a compound lens, focusing the beam within a vacuum enclosure using both a magnetic lens having permanent magnets outside the enclosure to produce a magnetic field at the beam, and a variable electrostatic lens within the enclosure.

Growing community of inventors

Eindhoven, Netherlands

Ali Mohammadi-Gheidari