Leybold Systems Gmbh

Alfred Rick

Klaus Michael

Helmut Eberhardt

Friedrich Anderle

J&ouml;rg Krempel-Hesse

Martin Bahr

Josef Hoffmann

Vacuum treatment system for application of thin layers onto substrates (,) with a transfer chamber (,) and several treatment chambers (,), said treatment chambers peripherally attached to the transfer chamber and being connected to said transfer chamber by means of a common opening (,) for inlet and outlet of substrate (,), and with a handling device (,) for transport of the substrate (,) between the treatment chambers (,), whereby the handling device (,) has at least one substrate holder (,) with one pivot and/or rotating retaining part to hold the substrates (,), by means of which the substrates (,) can pivot and/or rotate in the treatment chambers (,).

Vacuum treatment system for application of thin, hard layers

An apparatus is disclosed for the coating of substrates (,) with thin films, having a vacuum chamber (,), a target (,) to be atomized, situated opposite the substrate (,) in the vacuum chamber (,), with magnets (,) to produce a magnetic tunnel in front of the area of the target (,) to be atomized, an inlet (,) for a process gas into the process space (,), an anode (,), which is electrically insulated with respect to the vacuum chamber (,), and a current-voltage supply to produce a plasma in front of the target (,). The target (,) is shaped as a rotation-symmetrical body, which provides a ring-shaped enclosure around the substrate (,), wherein the magnets (,&prime;, . . . ) are supported on the side of the hollow cylindrical target (,), facing away from the substrate (,), and can move around the rotational axis (R) of the target (,). The substrate (,) is electrically insulated, with respect to the vacuum chamber (,), and a part of an insulator (,), configuring the anode (,), is supported on the bottom of the process space (,).

Apparatus for the coating of substrates in a vacuum chamber

A vacuum coating device coats substrates on all sides by rotating the substrates in a material flow. The device is for use in a vacuum chamber with a material source, and includes a holder for holding the substrates opposite the material source and drives correlated with the holder to bring about a rotation and shifting movement of the substrates. The device includes a hollow manipulator arm formed from three legs which extend at an angle with respect to one another. More specifically, the first leg extends at an obtuse angle with respect to the second leg, and the second leg extends at an approximately right-angle with respect to the third leg. The substrates are then held at the end of the third leg by the holder. The manipulator arm, when driven by a motor, can rotate around the longitudinal axis of the first leg, and, moreover, can move back and forth in the direction of this longitudinal axis. The holder includes a planetary gear system and substrate holders, which are made to rotate by the planetary gear system.

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Karlstein, Germany

Alfred Rick