Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Alexey Sergeevich Kuznetsov

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

Johannes Hubertus Josephina Moors

Andrey Alexandrovich Nikipelov

Pieter-Jan Van Zwol

Jan Steven Christiaan Westerlaken

Fei Liu

Antonius Theodorus Wilhelmus Kempen

Arjen Boogaard

Andrew David LaForge

Yue Ma

Jeroen Huijbregtse

William Peter Van Drent

Klaus Martin Hummler

Peter Gerardus Jonkers

Hendrikus Alphonsus Ludovicus Van Dijck

Rui Miguel Duarte Rodrigues Nunes

Parham Yaghoobi

Jeroen Hubert Rommers

Hubertus Johannes Van De Wiel

Umesh Prasad Gomes

Elena Nedanovska

Celal Korkmaz

Alexander Downn Kim

Qiushi Zhu

Fernando Brizuela

Rob Carlo Wieggers

Vadim Yevgenyevich Banine

Marcus Adrianus Van De Kerkhof

Johan Hendrik Klootwijk

Dirk Heinrich Ehm

Andrei Mikhailovich Yakunin

Mária Péter

Jozef Petrus Henricus Benschop

Arnoud Willem Notenboom

Eric Eva

Willem Joan Van Der Zande

Vitaliy Shklover

Johannes Christiaan Leonardus Franken

Holger Kierey

Adrianus Johannes Maria Giesbers

Luigi Scaccabarozzi

Dennis De Graaf

Evgenia Kurganova

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Aleksandar Nikolov Zdravkov

Maarten Van Kampen

Edwin Te Sligte

Ties Wouter Van Der Woord

Arno Schmittner

Ralf Winter

Irene Ament

Christof Jalics

Wolfgang Merkel

Alexander Ludwig Klein

Peter Simon Antonius Knapen

Hendrikus Jan Wondergem

Christoph Nottbohm

Mahdiar Valefi

Sander Baltussen

Florian Didier Albin Dhalluin

Hermanus Hendricus Petrus Theodorus Bekman

Arnoldus Jan Storm

Dries Smeets

Robert Meier

Tina Graber

Mária PÉTER

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

Prolonging optical element lifetime in an EUV lithography system

Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber () containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements () have a substrate () and a coating () that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area () in the coating () and covering the damaged area () with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors () for EUV lithography. After the repair, the optical elements have cover elements ().

Method for repairing reflective optical elements for EUV lithography

An optical element (), comprising: a substrate (), an EUV radiation reflecting multilayer system () applied to the substrate, and a protective layer system () applied to the multilayer system and having at least a first and a second layer (). The first layer () is arranged closer to the multilayer system () than is the second layer () and serves as a diffusion barrier for hydrogen. This first layer () has a lower solubility for hydrogen than does the second layer (), which serves for absorbing hydrogen. Also disclosed are an optical system for EUV lithography with at least one such optical element, and a method for treating an optical element in order to remove hydrogen incorporated in at least one layer () of the protective layer system and/or in at least one layer () of the multilayer system ().

Optical element and optical system for EUV lithography, and method for treating such an optical element

A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 10cm, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane

A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.

Radiation source-collector and method for manufacture

Growing community of inventors

Zaltbommel, Netherlands

Alexey Sergeevich Kuznetsov