Applied Materials, Inc.

Proxytrader, Inc.

Alexey Goder

Ilya Perlov

Eugene Gantvarg

David P Bour

Mark Yam

Alain Duboust

Howard E Grunes

Leonid Mark Tertitski

Evgueni Gantvarg

Apparatus and method for control of epitaxial growth parameters, for example during manufacture of light emitting diodes (LEDs). Embodiments include PL measurement of a group III-V film following growth while a substrate at an elevated temperature is in a transfer chamber of a multi-chamber cluster tool. In other embodiments, a film thickness measurement, a contactless resistivity measurement, and a particle and/or roughness measure is performed while the substrate is disposed in the transfer chamber. One or more of the measurements performed in the transfer chamber are temperature corrected to room temperature by estimating the elevated temperature based on emission from a GaN base layer disposed below the group III-V film. In other embodiments, temperature correction is based on an absorbance band edge of the GaN base layer determined from collected white light reflectance spectra. Temperature corrected metrology is then used to control growth processes.

Transfer chamber metrology for improved device yield

An Intelligent Data Multiplexer ('IDM') can be used to interface a plurality of host computers with a semiconductor manufacturing tool. In one embodiment, the IDM has a plurality of host-side ports configured to receive messages from each of the host computers interfaced with the semiconductor manufacturing tool. The IDM also includes a multiplexer configured to multiplex the messages received from the host-side ports. To process possible conflict messages from the host computers, the IDM has a conflict resolve module. The messages are then delivered from the IDM to the semiconductor manufacturing tool through a tool-side port used to connect the semiconductor manufacturing tool to the IDM.

Intelligent data multiplexer

A system, method and medium for controlling a wafer processing chamber using two or more processors (within one or more computer processing systems), wherein specified functions are assigned to each processor. Some embodiments contemplate that each processor may reside within its own computer processor system (each computer processor system being in communication with the other), wherein each computer processor system implements specified functions to control and maintain certain parameters involved in the manufacture of the wafer. This allows the present invention to react quickly to maintain rapidly-changing desired conditions within a wafer processing chamber and to maintain a greater degree of uniformity of those conditions throughout the wafer.

Multi-computer chamber control system, method and medium

A transfer chamber is provided. The transfer chamber has a temperature adjustment plate located in an upper portion of the chamber, a substrate handler located in a lower portion of the chamber, and a rotatable substrate carriage adapted so as to raise and lower between an elevation above a substrate supporting surface of the temperature adjustment plate, and an elevation below a substrate supporting blade of the substrate handler. The rotatable substrate carriage is adapted to transfer a substrate to and from the substrate supporting surfaces of the temperature adjustment plate, and of the substrate handler blade.

Method and apparatus for improved substrate handling

The present invention relates to a system and method for generation of strategies of investment in publicly traded stocks and a method of choosing the strategy with capital gain greater than traditional buy and hold strategy. The system and method is capable of generating thousands of investment strategies finding the best strategy delivering the optimal capital gain. The visualization method gives investor ability to analysis dynamics and stability of chosen strategy versus time with the speed of animation. Using Ad the system on a PC with 200-300 MZ CPU the user can analyze 20-40 different views for 5-10 seconds, which otherwise with the traditional technique takes more then 10,000 plots.

Method and system for visual analysis of investment strategies

A method and apparatus are provided for substrate handling. In a first aspect, a temperature adjustment plate is located below a substrate carriage and is configured such that a substrate may be transferred between the temperature adjustment plate and the substrate carriage by lifting and lowering the substrate carriage above and below the top surface of the temperature adjustment plate. The temperature adjustment plate may be configured to heat and/or cool a substrate positioned thereon. In a second aspect, the substrate carriage is magnetically coupled so as to rotate and/or lift and lower magnetically, thereby reducing particle generation via contact between moving parts (and potential chamber contamination therefrom). In a third aspect, a substrate handler positioned below the substrate carriage is both magnetically coupled and magnetically levitated, providing further particle reduction. The magnetic levitation is preferably achieved via four radially disposed and vertically arranged magnet pairs having distance sensors for maintaining desired spacing therebetween. In a most preferred embodiment, one substrate is heated/degassed on a first portion of a temperature adjustment plate in preparation for processing while a second substrate is processed, and a third processed substrate is cooled on a second portion of the temperature adjustment plate.

The present invention generally provides a rotary wafer carousel and related wafer handler for moving wafers or other workpieces through a processing system, i.e., a semiconductor fabrication tool. Generally, the present invention includes a rotary wafer carousel having a plurality of wafer seats disposed thereon to support one or more wafers. The rotary carousel is preferably disposed through the lid in a transfer chamber opposite the robot which is preferably disposed through the bottom of the transfer chamber. The rotary carousel and the robot cooperate to locate wafers adjacent to process chambers and move wafers into and out of various chambers of the system. The invention improves the throughput of the system by positioning wafers adjacent to the appropriate chamber to reduce the amount of movement required of the robot for transporting wafers between chambers.

Growing community of inventors

Sunnyvale, CA, United States of America

Alexey Goder