Other

Alexei Dmitrievich Chugai

Anatoly Borisovich Kondratenko

Nikolai Vasilievich Khaber

Alexei Alexeevich Chuiko

Valentin Anatolievich Tertykh

Mikhail Ivanovich Khoma

Malvina Leontievna Galashina

Jury Davydovich Shaposhnikov

Valery Mikhailovich Maschenko

Vyacheslav Valentinovich Pavlov

Alexandr Nikolaevich Kutin

Vilyam Alexandrovich Sobolev

Vasily Ivanovich Vatamanjuk

A method of producing fine-disperse alkylated silica compounds, characterized in that starting fine-disperse silica is subjected to treatment with water vapors at a temperature of 110.degree.-120.degree. C to attain the humidification degree of from 2 to 40 micromoles H.sub.2 O/m.sup.2 SiO.sub.2, the thus humidified silica being then treated with vapors of alkylchlorosilane at a temperature of 250.degree. to 310.degree. C. The method of the invention allows controlling the concentration of grafted alkyl groups in the resultant product within the range of from 4.7 to 8.0 micromoles of grafted alkyl groups per m.sup.2 of the surface of SiO.sub.2. Starting silica can be modified with oxides of metals, such as aluminium, titanium, iron or zirconium oxides, the resultant products exhibiting good hydrophobic properties when used as thickeners for lubrication materials.

Method of producing fine disperse alkylated silica compounds

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Kyiv, Ukraine

Alexei Dmitrievich Chugai