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Alexei Alexeevich Chuiko

Nikolai Vasilievich Khaber

Valentin Anatolievich Tertykh

Anatoly Borisovich Kondratenko

Arunas V Pasvyanskas

Alexandr S Golovkov

Mikhail Ivanovich Khoma

Alexei Dmitrievich Chugai

Raisa A Evlakhova

Jury Davydovich Shaposhnikov

Roman V Sushko

Alexandr Nikolaevich Kutin

Evgeny F Voronin

Vyacheslav Valentinovich Pavlov

Elena Alexandrovna Chuiko

Galina Y Guba

Iolita R Slushnene

Malvina Leontievna Galashina

Valery Mikhailovich Maschenko

Anatoly V Morev

Vilyam Alexandrovich Sobolev

Vasily Ivanovich Vatamanjuk

Valentin A Smirnov

A material consists of an electrically conducting support and a dielectric layer containing in % by weight: 17-80 of a polymeric binder and 20-83 of a finely divided mixed pyrogenic silicon and titanium oxide containing between 10 and 50% by weight of titanium.

Material for the electrostatic data recording containing silicon and

A method of producing aminated silica compounds, characterized in that starting silica is heated at a temperature of 200.degree.-500.degree. C for several hours in the absence of oxygen and moisture, then cooled down to a temperature of 100.degree.-250.degree. C and treated at this temperature with an amino alcohol. The resulting product is characterized in containing grafted amino groups, their concentration being much higher than that of free hydroxyl groups on the surface of the starting silicas. This feature enables to improve the properties of aminated silica compounds and, particularly, to increase adsorption capacity and activity thereof when said compounds are used as polymer fillers.

Method of producing aminated silica compounds

A method of producing fine-disperse alkylated silica compounds, characterized in that starting fine-disperse silica is subjected to treatment with water vapors at a temperature of 110.degree.-120.degree. C to attain the humidification degree of from 2 to 40 micromoles H.sub.2 O/m.sup.2 SiO.sub.2, the thus humidified silica being then treated with vapors of alkylchlorosilane at a temperature of 250.degree. to 310.degree. C. The method of the invention allows controlling the concentration of grafted alkyl groups in the resultant product within the range of from 4.7 to 8.0 micromoles of grafted alkyl groups per m.sup.2 of the surface of SiO.sub.2. Starting silica can be modified with oxides of metals, such as aluminium, titanium, iron or zirconium oxides, the resultant products exhibiting good hydrophobic properties when used as thickeners for lubrication materials.

Method of producing fine disperse alkylated silica compounds

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Kyiv, Ukraine

Alexei Alexeevich Chuiko