Asml Netherlands B.v.

Alexandru Onose

Seyed Iman Mossavat

Remco Dirks

Hugo Augustinus Joseph Cramer

Thomas Theeuwes

Anagnostis Tsiatmas

Bastiaan Onne Fagginger Auer

Sergey Tarabrin

Samee Ur Rehman

Mariya Vyacheslavivna Medvedyeva

Joannes Jitse Venselaar

Roger Hubertus Elisabeth Clementine Bosch

Siebe Tjerk De Zwart

Sander Silvester Adelgondus Marie Jacobs

Frank Jaco Buijnsters

Artur Palha Da Silva Clerigo

Nick Verheul

A method, computer program and associated apparatuses for metrology. The method includes determining a reconstruction recipe describing at least nominal values for use in a reconstruction of a parameterization describing a target. The method includes obtaining first measurement data relating to measurements of a plurality of targets on at least one substrate, the measurement data relating to one or more acquisition settings and performing an optimization by minimizing a cost function which minimizes differences between the first measurement data and simulated measurement data based on a reconstructed parameterization for each of the plurality of targets. A constraint on the cost function is imposed based on a hierarchical prior. Also disclosed is a hybrid model method comprising obtaining a coarse model operable to provide simulated coarse data; and training a data driven model to correct the simulated coarse data so as to determine simulated data for use in reconstruction.

Metrology method and apparatus, computer program and lithographic system

Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.

Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus

Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.

Method of determining a value of a parameter of interest of a target formed by a patterning process

Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data including a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data include at least one known value, and wherein at least one of the plurality of sets of data includes an unknown value, the apparatus including a processor to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data, a first condition between two or more values within a set of data of the plurality of sets of data, and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.

Estimation of data in metrology

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Eindhoven, Netherlands

Alexandru Onose