Carl Zeiss Smt Gmbh

Alexander Winkler

Michael Patra

Martin Endres

Daniel Lenz

Jochen Hetzler

Hans Michael Stiepan

Thomas Fischer

Frank Eisert

Martin Scheid

Michael Ramolla

Annie Isaac

A diffractive optical element () for a test interferometer () measures a shape of an optical surface (). Diffractive shape measuring structures () are arranged on a used surface () of the element and generate a test wave () irradiating the surface when the element is arranged in the interferometer. At least one test field () several profile properties of test structures contained in the test field. The profile properties characterize a profile line of the test structures extending transversely with respect to the used surface and include a flank angle of the profile line, a profile depth and a depth of a microtrench in a bottom region of a trench-shaped profile of the test structures. The test field is arranged at one location of the used surface instead of the diffractive shape measuring structures such that the test field is surrounded by several diffractive shape measuring structures.

Diffractive optical element for a test interferometer

A method for setting an illumination setting for illuminating an object field of a projection exposure apparatus includes taking into account the sensitivity of a performance variable for changes in the intensity of the illumination radiation in the illumination pupil.

Method for adjusting a lighting setting

An illumination optical unit for EUV projection lithography includes a field facet mirror and a pupil facet mirror. A correction control device, which is used for the controlled displacement of at least some field facets that are usable as correction field facets, which are signal connected to displacement actuators, is embodied so that a correction displacement path for the correction field facets is so large that a respective correction illumination channel is cut off at the margin by the correction pupil facet so that the illumination light partial beam is not transferred in the entirety thereof from the correction pupil facet into the object field.

Illumination optics for EUV projection lithography

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Heidenheim, Germany

Alexander Winkler