International Business Machines Corporation

Alexander Starikov

Douglas S Goodman

A pattern is formed on a substrate by the process of providing a substrate having a surface with previously patterned features having a non-uniform electromagnetic reflectivity, applying a second image recording material to the surface, employing the features with a non-uniform physical property of reflectivity to delineate a desired pattern in the second image recording material and applying electromagnetic energy to take advantage of the reflectivity features to provide variable processing of the second material.

Multi-layer integrated imaging/image recording process with improved image tolerances

Image recording process with improved image tolerances using embedded AR

A method and apparatus is provided for estimating the centerline of an alignment/overlay measurement target by means of projecting light from a tunable, variable wavelength the illumination source onto the target, then performing optical observation of the measurement mark and providing an output signal representing the quantity measured in the observation, computing from the output signal a criterion of signal asymmetry to provide an output product, and tuning the tunable illumination source as a function of the output product. As a result tuning adjustment of the wavelength of illumination is employed to expose an observed feature, and the illumination source is tuned until the criterion is minimized, thus improving the accuracy of the estimated centerline.

Growing community of inventors

Fishkill, NY, United States of America

Alexander Starikov