Carl Zeiss Smt Gmbh

Alexander Sauerhoefer

Toralf Gruner

Markus Hauf

Jochen Weber

Ulrich Schoenhoff

Arif Kazi

Payam Tayebati

Michael Thier

Ole Fluegge

Gerhard Focht

Eric Eva

Timo Laufer

Aksel Goehnermeier

Dirk Hellweg

Tilmann Heil

An optical arrangement in an optical system, such as a microlithographic projection exposure apparatus, includes: at least one heat-emitting subsystem which emits heat during the operation of the optical system; a first heat shield which is arranged such that it at least partly absorbs the heat emitted by the heat-emitting subsystem; a first cooling device which is in mechanical contact with the first heat shield and is designed to dissipate heat from the first heat shield; and a second heat shield which at least partly absorbs heat emitted by the first heat shield. The second heat shield is in mechanical contact with a cooling device that dissipates heat from the second heat shield.

Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Optical element and method

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Optical correction device

Growing community of inventors

Hamburg, Germany

Alexander Sauerhoefer